Chemical mechanical polishing liquid for titanium

A chemical machinery and polishing liquid technology, applied in the field of polishing liquid, can solve the problems of surface corrosion, difficult to control polishing speed, poor surface performance, etc., and achieve the effect of low surface corrosion, good surface quality and controllable rate.

Active Publication Date: 2015-05-06
SHANGHAI XINANNA ELECTRONICS TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The object of the present invention is to provide a chemical mechanical polishing solution for titanium, which is used to overcome the problems of poor surface performance and difficult control of polishing speed and serious surface corrosion of titanium sheet surface polishing in the prior art

Method used

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  • Chemical mechanical polishing liquid for titanium
  • Chemical mechanical polishing liquid for titanium
  • Chemical mechanical polishing liquid for titanium

Examples

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Effect test

Embodiment 1

[0043] In this embodiment, the chemical mechanical polishing solution contains the following raw material components and parts by weight:

[0044]

[0045] The polishing particles described in this embodiment are silicon oxide particles; the particle size is 60 nm; the oxidizing agent is hydrogen peroxide; the pH regulator is nitric acid solution; the surfactant is sodium polyacrylate; the organic additive is glycine.

[0046] The chemical mechanical polishing solution has a pH of 1.

[0047] The chemical mechanical polishing fluid is obtained by stirring the above-mentioned raw material components evenly.

Embodiment 2

[0049] In this embodiment, the chemical mechanical polishing solution contains the following raw material components and parts by weight:

[0050]

[0051] The polishing particles described in this embodiment are titanium oxide particles; the particle size is 150 nm; the oxidant is potassium ferricyanide; the pH regulator is phosphoric acid; the surfactant is polyoxyethylene sodium sulfate; the organic additive is salicylic acid.

[0052] The pH of the chemical mechanical polishing solution is 5.

[0053] The chemical mechanical polishing fluid is obtained by stirring the above-mentioned raw material components evenly.

Embodiment 3

[0055] In this embodiment, the chemical mechanical polishing solution contains the following raw material components and parts by weight:

[0056]

[0057] The polishing particles described in this embodiment are alumina particles; the particle size is 80nm; the oxidizing agent is ammonium persulfate; the pH regulator is sodium hydroxide; the surfactant is sodium lauryl sulfate; the organic additive is citric acid.

[0058] The chemical mechanical polishing solution has a pH of 11.

[0059] The chemical mechanical polishing fluid is obtained by stirring the above-mentioned raw material components evenly.

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Abstract

The invention discloses a chemical mechanical polishing liquid for titanium. Based on the total mass, the chemical mechanical polishing liquid for titanium comprises the following raw material components in percentage by weight: 1-5wt% of an oxidant, 0.01-4wt% of a surfactant, 0.01-3wt% of an organic additive, 0.2-30wt% of polishing particles and the balance of pH regulators and water. According to the chemical mechanical polishing liquid disclosed by the invention, the chemical mechanical polishing liquid of different components is utilized for polishing titanium metal with the advantages of controllable rate, high surface quality and low corrosion, and the requirements on the surface quality of the titanium metal in the industry can be met.

Description

technical field [0001] The invention relates to a polishing liquid, in particular to a chemical mechanical polishing liquid for titanium. Background technique [0002] Titanium has significant advantages such as high specific strength, good corrosion resistance, high heat resistance, and good biocompatibility, so it is widely used in high-tech fields such as medicine, aerospace, and microelectronics. Since the 1950s, research on titanium alloys has shown a blowout trend. In 1954, the United States took the lead in researching the first-generation titanium alloy Ti-6Al-4V (Ti64 for short). This alloy is the trump card alloy in the titanium alloy industry, and its usage accounts for 75% to 80% of all titanium alloys. In the 1950s and 1960s, the high temperature resistance and high specific strength of titanium alloys were further emphasized and improved, and they were gradually used in the manufacture of structural devices for aircraft and space shuttles. In the 1980s, the h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F3/04
Inventor 梁晨亮刘卫丽宋志棠
Owner SHANGHAI XINANNA ELECTRONICS TECH
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