Manufacturing method of flexible buried electrode film using thermal lamination transfer
A flexible electrode and thin film technology, which is applied in the direction of thermoplastic polymer dielectric, printed circuit manufacturing, cable/conductor manufacturing, etc., can solve the problems of conductive thin film, wet dissolution speed reduction, etc., to prevent pattern damage or short circuit, excellent resistance value , Eliminate the effect of plane difference
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example 1
[0102] A PET substrate with a thickness of 180 μm was coated with a 5 mm thick polydimethylsiloxane (PDMS) (SYLGARD 184, purchased from Dow Corning Corp.) solution (mixing ratio 1:9), and then cured at 70 °C for 6 hours to prepare a release substrate. Using e-electron beam deposition machine (base pressure: 8×10 -7 Torr, working pressure: 5×10 -5 trust, ) A 150 nm thick Al foil was deposited on the release surface of the release substrate.
[0103] Using AZ1518 photoresist, coating, drying, mask exposure and development were performed to form a pattern on the Al deposition film.
[0104] The formed photoresist pattern is subjected to wet etching (phosphoric acid-based Al etching solution) or dry etching (ICP-RIE) to form an Al electrode pattern. Based on observations through an optical microscope, such as figure 2 Al electrode patterns are formed as shown.
[0105] On the Al electrode pattern, place a 250 μm EVA (ethylene vinyl acetate) film (pouch laminating film, pur...
example 2
[0108] Fabricate the flexible conductive embedded electrode film in the same manner as in Example 1, the difference is that, with 1~5wt% dilute fluorinated silane (OPTOOL TM , purchased from Daikin Industries, LTD.) solution was spin-coated on a PET substrate with a thickness of 180 μm, and then dried at 120° C. for 30 minutes to prepare a release substrate.
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