Preparation method for niobium nitride/ titanium aluminum nitride zirconium-niobium quaternary double-layered nitride film

A technology of titanium aluminum nitride and nitride film, which is applied in the direction of coating, metal material coating process, ion implantation plating, etc., can solve the complex preparation method, low efficiency, hardness, film/substrate bonding force and wear resistance And the high temperature oxidation resistance can not meet the cutting requirements and other problems, to achieve the effect of simple preparation process, easy operation of the preparation process, and improvement of high temperature oxidation resistance

Inactive Publication Date: 2015-06-24
SHENYANG UNIV
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  • Application Information

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Problems solved by technology

Therefore, the main disadvantage of this film is that its hardness, film / substrate bonding force, wear resistance and high temperature oxidation resistance cannot meet the cutting requirements under extremely harsh conditions.
[0005] For the titanium-aluminum-zirconium-niobium nitride quaternary film with gradient structure, although the hardness, film / substrate bonding force, wear resistance and high temperature oxidation resistance of the film are greatly improved, the main disadvantage of the film is that its preparation method is relatively complicated. Usually need to continuously adjust the nitrogen flow or target arc current, the efficiency is low

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Preparation of niobium nitride / titanium aluminum zirconium niobium nitride quaternary double-layer nitride film on WC-8%Co cemented carbide drill bit, the method is:

[0021] 1. Determination of deposition technology: determine that the multi-arc ion plating technology is the deposition technology of niobium nitride / titanium aluminum zirconium niobium nitride quaternary double layer nitride film.

[0022] 2. Selection of target material composition: a combination of one niobium target and three titanium-aluminum-zirconium alloy targets is selected as the arc source, the four targets are arranged at 90 degrees to each other, the purity of the niobium target is 99.99%, and the titanium-aluminum-zirconium alloy target is The atomic ratio of titanium:aluminum:zirconium is 65:30:5.

[0023] 3. Workpiece selection and pretreatment process: WC-8%Co cemented carbide drill bit is selected as the workpiece, and its surface is subjected to conventional degreasing and decontaminati...

Embodiment 2

[0030] Preparation of niobium nitride / titanium aluminum zirconium niobium nitride quaternary double layer nitride film on W18Cr4V high speed steel milling cutter, the method is:

[0031] 1. Determination of deposition technology: determine the multi-arc ion plating technology as the deposition technology of niobium nitride / titanium aluminum zirconium niobium nitride quaternary double layer nitride film.

[0032] 2. Selection of target material composition: a combination of one niobium target and three titanium-aluminum-zirconium alloy targets is selected as the arc source, the four targets are arranged at 90 degrees to each other, the purity of the niobium target is 99.99%, and the titanium-aluminum-zirconium alloy target is The atomic ratio of titanium:aluminum:zirconium is 65:30:5.

[0033] 3. Workpiece selection and pretreatment process: W18Cr4V high-speed steel milling cutter is selected as the workpiece. The surface is degreased and decontaminated with metal detergent, th...

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Abstract

A preparation method for a niobium nitride/ titanium aluminum nitride zirconium-niobium quaternary double-layered nitride film comprises the following steps of (1) determinng a deposition technology; (2) using a target composition; (3) selecting and pre-treating workpieces; (4) performing pre-bombarding technology; (5) performing a deposition technology; (6) performing a heating and cooling-down technology; and (7) rotating the workpieces. By the preparation method for the niobium nitride/ titanium aluminum nitride zirconium-niobium quaternary double-layered nitride film, high hardness and high film/base binding force of the film are guaranteed, the wear resistance of the film is improved, and the high-temperature-resistant oxidation performance of the film is greatly improved. Moreover, the preparation method is simple and is easy to operate, the work efficiency is greatly improved, and the film plating cost is reduced.

Description

technical field [0001] The invention relates to a method for preparing a niobium nitride / titanium aluminum zirconium niobium nitride quaternary double-layer nitride film. Background technique [0002] Multi-arc ion plating has the advantages of high ionization rate, low deposition temperature, fast film formation rate, strong binding force, dense film structure and easy adjustment of process parameters. This technology is suitable for the preparation of composite hard films, and is suitable for titanium-based multi-layer single-layer, multi-layer double-layer and multi-layer gradient hard films such as titanium nitride, titanium aluminum nitride, titanium aluminum zirconium nitride, and titanium aluminum zirconium chromium nitride. The preparation aspect has been successfully applied. [0003] For the nitride film of titanium, aluminum, zirconium and niobium four components, it has more than one element nitride film such as titanium nitride, binary nitride film such as tita...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/46C23C14/06
Inventor 赵时璐张钧张震王双红张正贵
Owner SHENYANG UNIV
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