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Preparing method of fluoridation-reduced graphene oxide

A graphene and fluorination technology, applied in the field of preparation of fluorinated reduced graphene oxide, can solve problems such as inability to prepare fluorinated reduced graphene oxide, uncontrollable number of layers and fluorination degree, etc. Simple equipment and process, good controllability

Inactive Publication Date: 2015-09-23
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method cannot prepare large-area fluorinated reduced graphene oxide, and the number of layers and the degree of fluorination are uncontrollable.

Method used

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  • Preparing method of fluoridation-reduced graphene oxide
  • Preparing method of fluoridation-reduced graphene oxide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Take a cylindrical reduced graphene oxide with a diameter of 1 cm and a height of 0.5 cm, place it on a 4-inch liner, put it into the sample delivery chamber of the deep reaction etching machine, and pump the air pressure in the sample delivery chamber to 10 -3 Below Torr, it is sent into the reaction chamber; after the sample is fixed, the air pressure in the reaction chamber is pumped to 10 -6 Below Torr, then pass into SF 6 Gas, flow rate is 100 sccm; for SF 6 Perform plasma excitation with a power of 200W, and the reaction time is 1 minute; after the reaction is completed, fill with nitrogen, and when the pressure in the reaction chamber is the same as that of the sample delivery chamber, transfer the sample to the sample delivery room, and continue to fill with nitrogen until it reaches atmospheric pressure Remove the sample on the liner. At this time, the reduced graphene oxide has reacted to generate fluorinated reduced graphene oxide.

[0019] XPS characteriz...

Embodiment 2

[0021] Take 1x1x1cm 3 Reduced graphene oxide samples in large and small cubes, place it on a 4-inch liner, put it into the sample delivery chamber, and pump the air pressure in the sample delivery chamber to 10 -3 Below Torr, it is sent into the reaction chamber; after the sample is fixed, the air pressure in the reaction chamber is pumped to 10 -6 Below Torr, then pass into SF 6 Gas, flow rate is 100 sccm; for SF 6 Perform plasma excitation with a power of 25W, and the reaction time is 20 minutes; after the reaction is completed, fill with nitrogen gas, and when the pressure of the reaction chamber is the same as that of the sample delivery chamber, transfer the sample to the sample delivery chamber, and continue to fill with nitrogen gas until it reaches atmospheric pressure The sample on the liner was taken out to obtain the fluorinated reduced graphene oxide.

Embodiment 3

[0023] Take a disc-shaped reduced graphene oxide with a diameter of 4 inches and a height of 0.5 cm, put it on a 4-inch liner, put it into the sample delivery chamber of the deep reaction etching machine, and pump out the air pressure in the sample delivery chamber. to 10 -3 Below Torr, it is sent into the reaction chamber; after the sample is fixed, the air pressure in the reaction chamber is pumped to 10 -6 Below Torr, then pass into SF 6 Gas, flow rate is 100 sccm; for SF 6 Perform plasma excitation with a power of 300W, and the reaction time is 30s; after the reaction is completed, fill with nitrogen gas, and when the pressure of the reaction chamber is the same as that of the sample delivery chamber, transfer the sample to the sample delivery room, and continue to fill with nitrogen gas until it reaches atmospheric pressure Remove the sample on the liner. At this time, the reduced graphene oxide on the copper grid has reacted to form fluorinated reduced graphene oxide....

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Abstract

The invention discloses a preparing method of fluoridation-reduced graphene oxide. The fluoridation-reduced graphene oxide is prepared mainly by subjecting SF6 gas as fluridizer to deep reaction etching. The fluoridation-reduced graphene oxide prepared is in any required shape. The fluoridation-reduced graphene oxide prepared is highly fluoridized and has good fluoride property; the preparing method is suitable for the preparation of large-size fluoridation-reduced graphene oxides. Compared with other fluoridation methods, the preparing method has such advantages that the equipment and the process are simple, controllability is good, preparation cost is low, and the preparing method is available for mass production. The fluoridation-reduced graphene oxide prepared is of wafer level in size; good basis is laid for the study on the properties of the fluoridation-reduced graphene oxide and the processing of fluoridized graphene devices.

Description

technical field [0001] The invention belongs to the field of new materials, and relates to a preparation method of fluorinated-reduced graphene oxide. Background technique [0002] As a new derivative of graphene, fluorinated reduced graphene oxide not only maintains the high-strength properties of graphene, but also brings novel interface and physical properties such as reduced surface energy, enhanced hydrophobicity and widened band gap due to the introduction of fluorine atoms. chemical properties. At the same time, fluorinated graphene is resistant to high temperature and has stable chemical properties, showing properties similar to polytetrafluoroethylene, and is called "two-dimensional Teflon". These unique properties of fluorinated graphene make it have broad application prospects in the fields of interfaces, new nanoelectronic devices, and lubricant materials. [0003] At present, one method of routinely synthesizing fluorinated graphene is to use XeF 2 Fluorinati...

Claims

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Application Information

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IPC IPC(8): C01B31/04
Inventor 徐杨陆薇孟楠万霞程呈阿亚兹郭宏伟周翰铭王雪施添锦王锋马玲玲刘雪梅李炜刘威
Owner ZHEJIANG UNIV
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