Method for preparing Ni52Mn24Ga24 alloy film through laser pulse sputtering deposition

A ni52mn24ga24, sputtering deposition technology, applied in the field of metal alloys, can solve the problems of low strength, high brittleness of Ni-Mn-Ga, etc., and achieve the effect of high strength, strong anisotropy and low roughness

Inactive Publication Date: 2015-09-30
DALIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to solve the problems of high brittleness and low strength of the existing ferromagnetic shape memory alloy Ni-Mn-Ga, the present invention provides a laser pulse sputtering deposition to prepare Ni 52 mn 24 Ga 24 Alloy Thin Film Method

Method used

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  • Method for preparing Ni52Mn24Ga24 alloy film through laser pulse sputtering deposition
  • Method for preparing Ni52Mn24Ga24 alloy film through laser pulse sputtering deposition
  • Method for preparing Ni52Mn24Ga24 alloy film through laser pulse sputtering deposition

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Embodiment 1

[0023] The test alloy target is selected from three metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-Ga. According to the molar ratio, 52 parts of Ni, 24 parts of Mn, 24 parts Ga is placed in a vacuum non-consumable electrode electric arc furnace, and the furnace chamber is evacuated before melting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50 mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz g...

Embodiment 2

[0025] The test alloy target is selected from three metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-Ga. According to the molar ratio, 52 parts of Ni, 24 parts of Mn, 24 parts Ga is placed in a vacuum non-consumable electrode electric arc furnace, and the furnace chamber is evacuated before melting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50 mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz g...

Embodiment 3

[0027]The test alloy target is selected from three metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-Ga. According to the molar ratio, 52 parts of Ni, 24 parts of Mn, 24 parts Ga is placed in a vacuum non-consumable electrode electric arc furnace, and the furnace chamber is evacuated before melting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50 mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz gl...

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Abstract

The invention relates to a method for preparing a Ni52Mn24Ga24 alloy film through laser pulse sputtering deposition. The method comprises the following steps: respectively placing metal simple substances Ni, Mn and Ga in a vacuum nonconsumable electrode electric arc furnace for smelting according to the mole ratio of 52:24:24; vacuumizing the interior of the electric arc furnace to 5*10<-3> Pa, and introducing inert gas for protection so as to obtain a round target material; placing a treated glass substrate and the target material in a vacuum system, and vacuumizing to 1*10<-4> Pa, wherein the temperature of the glass substrate is 550-600 DEG C and the distance between the glass substrate and the target material is 3-5 cm; emitting laser through a laser, wherein the frequency is 3-6 Hz, and the sputtering time is 40-170 minutes; finally, annealing for 0.5-3 h at 800-850 DEG C so as to prepare the Ni52Mn24Ga24 alloy film. The prepared Ni52Mn24Ga24 alloy film is more accurate in component, low in roughness, smoother in surface, high in anisotropy, good in toughness, high in strength, simple in preparation process, and easy for industrial production and has an important practical value for micro intelligence and high integration.

Description

technical field [0001] The invention belongs to the technical field of metal alloys, and relates to a new method for preparing a ferromagnetic shape memory alloy thin film, specifically a method for preparing Ni by laser pulse sputtering deposition. 52 mn 24 Ga 24 alloy thin film method. Background technique [0002] Ni-Mn-Ga ferromagnetic shape memory alloy is a new type of shape memory material, which has both thermoelastic martensitic transformation and ferromagnetic transformation. It not only has the shape memory effect of traditional shape memory alloy controlled by temperature field, but also can be used in The shape memory effect is produced under the action of a magnetic field. The response frequency of its magnetically controlled shape memory effect is close to that of piezoelectric ceramics, and its output strain is close to that of temperature-controlled shape memory alloys. It is a new type of functional material with great engineering application prospects. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/18
Inventor 董桂馥
Owner DALIAN UNIV
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