Method for preparing Ni52Mn24Ga24 alloy film through laser pulse sputtering deposition
A ni52mn24ga24, sputtering deposition technology, applied in the field of metal alloys, can solve the problems of low strength, high brittleness of Ni-Mn-Ga, etc., and achieve the effect of high strength, strong anisotropy and low roughness
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Embodiment 1
[0023] The test alloy target is selected from three metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-Ga. According to the molar ratio, 52 parts of Ni, 24 parts of Mn, 24 parts Ga is placed in a vacuum non-consumable electrode electric arc furnace, and the furnace chamber is evacuated before melting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50 mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz g...
Embodiment 2
[0025] The test alloy target is selected from three metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-Ga. According to the molar ratio, 52 parts of Ni, 24 parts of Mn, 24 parts Ga is placed in a vacuum non-consumable electrode electric arc furnace, and the furnace chamber is evacuated before melting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50 mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz g...
Embodiment 3
[0027]The test alloy target is selected from three metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-Ga. According to the molar ratio, 52 parts of Ni, 24 parts of Mn, 24 parts Ga is placed in a vacuum non-consumable electrode electric arc furnace, and the furnace chamber is evacuated before melting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50 mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz gl...
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