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Method for preparing multiphase coupled WS2/WN solid lubrication film

A film manufacturing method and solid lubrication technology, which are applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of easy wear and failure of solid lubricating films, improve the friction and wear performance of the film, and have a low friction coefficient. , optimize the effect of thin film structure

Active Publication Date: 2015-10-07
BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a multi-phase coupled WS 2 / WN Solid Lubricating Thin Film Manufacturing Method to Solve Pure WS 2 The problem of easy wear and failure of solid lubricating film

Method used

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  • Method for preparing multiphase coupled WS2/WN solid lubrication film
  • Method for preparing multiphase coupled WS2/WN solid lubrication film
  • Method for preparing multiphase coupled WS2/WN solid lubrication film

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Embodiment 1

[0065] see Figure 5 , Figure 5 It is a structural schematic diagram of a manufacturing device according to an embodiment of the present invention. The manufacturing device comprises a vacuum chamber 10 and a low-energy ion source 20 connected with the vacuum chamber 10, a magnetron sputtering target 30 and a microwave source 40, and the microwave source 40 is provided with N gas inlet 50, and the magnetron sputtering target 30 An Ar gas inlet 60 and a cooling water inlet 70 are provided.

[0066] Put the metal material substrate 1 as the sample on the sample stage of the vacuum chamber 10, and vacuumize to 3.0×10 -4 After Pa, through N 2 The gas inlet 50 is filled with argon gas with a purity of 99.99%, and the low-energy ion source 20 is turned on to perform ion bombardment cleaning on the sample to remove the gas or impurities attached to the surface. After the cleaning is completed, use the magnetron sputtering target 30 and the microwave source 40 to start the sputte...

Embodiment 2

[0070] Put the metal material matrix 1 on the sample stage of the vacuum chamber 10, and evacuate to 3.0×10 -4 Pa, filled with 99.99% argon, turned on the low-energy ion source 20 to clean the sample by ion bombardment. After the cleaning is completed, the sputtering deposition process starts, the sputtering gas uses Ar, and the reaction gas uses N 2 . First deposit a layer of WS 2 Film layer 2, and then deposit a layer of WS 2 / WN composite film layer 3, cycled sequentially, where WS 2 Film layer 2 deposited ten layers, WS 2 / WN composite film layer 3 deposited ten layers.

[0071] deposited WS 2 The parameters used for film layer 2 are preferably: sputtering voltage -600~-800V, sputtering current 2A, sputtering pressure 8×10 -2 -1×10 -1 Pa, sputtering time 5-8min. Ar gas flow 30-40sccm.

[0072] deposited WS 2 The parameters used during the / WN composite film layer 3 are preferably: sputtering voltage-800~-900V, sputtering current 2A, sputtering pressure 8×10 -2 ...

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Abstract

The invention discloses a method for preparing a multiphase coupled WS2 / WN solid lubrication film. The multiphase coupled WS2 / WN solid lubrication film is formed on the surface of a metal material base body in a magnetron sputtering method. The method for preparing the multiphase coupled WS2 / WN solid lubrication film includes the steps that the metal material base body to be processed is preprocessed; the metal material base body is put into a vacuum room, and vacuum pumping is conducted; a low-energy ion source is used for conducting ion bombardment cleaning on the metal material base body; a magnetron sputtering device is used for conducting surface modification on the metal material base body, Ar gas and N2 gas are used as magnetron sputtering and reacting gases, WS2 serves as the target material, a WS2 film layer is deposited on the surface of the metal material base body firstly, then a WS2 / WN film composite film layer is deposited, the operation of depositing a WS2 film layer and the operation of depositing a WS2 / WN composite film layer are cycled in turns, and 1-10 WS2 film layers are deposited and 1-10 WS2 / WN composite film layers are deposited; the metal material base body is put into an acetone solution to be cleaned and then dried, and the dried metal material base body is sealed and stored in a vacuum mode.

Description

technical field [0001] The invention relates to the manufacture of solid lubricating films, in particular to a method for manufacturing multiphase coupled WS using magnetron sputtering 2 / WN solid lubricant film method. Background technique [0002] Currently tungsten disulfide (WS 2 ) film is one of the main research directions in the field of new solid lubrication at home and abroad. Tungsten disulfide has a low friction coefficient, high extreme pressure resistance, and oxidation resistance is better than the current mainstream solid lubricant MoS 2 , suitable for harsh conditions such as high temperature, high vacuum, high load, high speed, high radiation, strong corrosion, and ultra-low temperature. The United States took the lead in applying it to military fields such as Mars exploration robots, airplanes, and space shuttles. But WS 2 The solid lubricating film has low hardness and is easy to wear. Under the action of high speed and high load, the lubricating film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35
Inventor 金杰王月黄晓林王丽叶
Owner BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
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