Solar spectrum selective absorbing coating and preparation method thereof
A technology of solar spectrum and absorption coating, applied in coating, solar thermal device, solar thermal power generation and other directions, can solve the problems of difficult control of coating process, increased absorption in near-infrared region, inconvenient for mass production, etc. Coating equipment requires low, low thermal emissivity, and the effect of simple preparation process
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preparation example Construction
[0033] For the preparation of the substrate, a polished metal plate or glass plate is selected, and after mechanical cleaning, a radio frequency argon ion cleaning is performed to remove the surface contamination layer and oxide layer, and to enhance the surface activity of the substrate.
[0034] Infrared reflective layer preparation, a metal infrared reflective layer is prepared on the surface of the above-mentioned base layer by (pulsed) DC magnetron sputtering. The selected target material can be metallic aluminum (purity above 99.7%).
[0035] The absorption layer is prepared by (pulsed) DC magnetron sputtering method to prepare the absorption layer on the above-mentioned infrared reflection layer. The selected target material is semiconductor Ge (purity above 99.7%).
[0036] The anti-reflective layer is prepared by (pulsed) DC reactive magnetron sputtering method to prepare the anti-reflective layer on the above absorption layer. The selected target is metal Ti (purity above 99...
Embodiment example
[0038] Table 1 shows the process control thickness of each single-layer film in an example of preparing a spectrally selective absorption coating based on the intrinsic absorption of semiconductor germanium by magnetron sputtering.
[0039] Table 1
[0040]
[0041] The preparation of the embodiment was carried out according to the above preparation method, and the specific operation steps are as follows:
[0042] 1) Cleaning of the glass substrate: first use a neutral detergent to clean the glass substrate; then in the filming room of the coating equipment, the surface of the glass substrate is bombarded with a radio frequency ion source for secondary cleaning. The process parameters are set as follows: RF The sputtering power of the power supply is 200w, the flow of working gas Ar (purity 99.99%) is 45sccm, the working pressure is 9.8×10-2mTorr, and the sputtering time is 360s.
[0043] 2) The glass substrate is transported into the sputtering chamber through the filming equipment i...
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