Polysilicon floating gate memorizer based on organic field effect transistor and preparation method therefor.

A polysilicon, organic field technology, applied in transistors, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., can solve the problems of high operating voltage and high manufacturing cost, and achieve the effect of reducing operating voltage, improving retention characteristics, and improving mobility.

Inactive Publication Date: 2015-10-28
LANZHOU UNIVERSITY
View PDF1 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a polysilicon floating gate memory based on an organic field effect transistor and a preparation method thereof, so as to solve the problems of high operating voltage and high manufacturing cost of the existing organic field effect transistor floating gate memory

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polysilicon floating gate memorizer based on organic field effect transistor and preparation method therefor.
  • Polysilicon floating gate memorizer based on organic field effect transistor and preparation method therefor.
  • Polysilicon floating gate memorizer based on organic field effect transistor and preparation method therefor.

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] The present invention will be described in detail below in combination with specific embodiments.

[0031] The structure of the polysilicon floating gate memory based on the organic field effect transistor of the present invention is as figure 1 As shown, its preparation process is as follows:

[0032] 1) Put the cleaned heavily doped silicon wafer into a thermal oxidation furnace, and thermally oxidize and grow a layer of SiO with a thickness of about 150-300nm on the silicon surface. 2 Thin layer, forming the gate insulating dielectric layer 2 of the device, such as figure 2 .

[0033] 2) Using CVD method, on SiO 2 A polysilicon layer with a thickness of 20-40nm (deposition rate of about 5nm / min) grown on the surface is used as the floating gate 3 of the device, such as image 3 .

[0034] 3) Using the ion implantation method, perform low-concentration arsenic ion doping in the polysilicon floating gate region (the doping concentration is about 10 16 / cm 3 ). ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a polysilicon floating gate memorizer based on an organic field effect transistor and a preparation method therefor. A gate electrode employs a heavy-doping low-resistance monocrystalline silicon substrate with a thickness of 100-300nm; a gate insulation dielectric layer is formed on the surface of the silicon substrate of the gate electrode; a polysilicon floating gate is embedded between the gate insulation dielectric layer and a tunneling insulation dielectric layer and employed as a charge storage unit; the tunneling insulation dielectric layer is formed on the surface of the floating gate; an organic semiconductor material is grown on the surface of the tunneling insulation dielectric layer and forms an active layer of a device; vacuum vapor plating of metal through metal masks is carried out on the surface of the active layer, and a source electrode and a drain electrode of the device are formed. The beneficial effects are that a work voltage of a floating gate memorizer based on an organic field effect transistor is decreased, high-density storage of a device is achieved, the device maintaining performance is raised, and the device manufacturing cost is lowered.

Description

technical field [0001] The invention belongs to the technical field of electronic components, and relates to a polysilicon floating gate memory based on an organic field effect transistor and a preparation method thereof. Background technique [0002] With the continuous development of electronic information technology, electronic information products have gradually penetrated into every aspect of people's life, work and study. People's demand for low-cost, low-power, portable and miniaturized electronic devices is increasing. The traditional silicon-based It is difficult for non-volatile memory to meet the above new requirements. Organic floating gate memory is a new type of organic electronic device developed based on organic thin film field effect transistor. Attention is a new type of electronic device with very promising application prospects in the future. [0003] The structure of organic floating gate memory is similar to that of organic field effect transistors (OF...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/788H01L21/336H01L29/04H01L51/05
CPCH01L29/04H01L29/66825H01L29/788H10K10/00
Inventor 杨建红闫兆文肖彤谌文杰杨盼乔坚栗王娇
Owner LANZHOU UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products