Polysilicon floating gate memorizer based on organic field effect transistor and preparation method therefor.
A polysilicon, organic field technology, applied in transistors, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., can solve the problems of high operating voltage and high manufacturing cost, and achieve the effect of reducing operating voltage, improving retention characteristics, and improving mobility.
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[0030] The present invention will be described in detail below in combination with specific embodiments.
[0031] The structure of the polysilicon floating gate memory based on the organic field effect transistor of the present invention is as figure 1 As shown, its preparation process is as follows:
[0032] 1) Put the cleaned heavily doped silicon wafer into a thermal oxidation furnace, and thermally oxidize and grow a layer of SiO with a thickness of about 150-300nm on the silicon surface. 2 Thin layer, forming the gate insulating dielectric layer 2 of the device, such as figure 2 .
[0033] 2) Using CVD method, on SiO 2 A polysilicon layer with a thickness of 20-40nm (deposition rate of about 5nm / min) grown on the surface is used as the floating gate 3 of the device, such as image 3 .
[0034] 3) Using the ion implantation method, perform low-concentration arsenic ion doping in the polysilicon floating gate region (the doping concentration is about 10 16 / cm 3 ). ...
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