The invention provides a gating tube material, a gating tube unit and a memory device structure. The gating tube material is a compound at least comprising Ge and S, the chemical general formula of the gating tube material is (GexS<1-x>)<1-y>My, M comprises a doped material, x is greater than or equal to 0.1 and less than or equal to 0.9, and y is greater than or equal to 0 and less than or equalto 0.5. The gating tube is made of a GexS<1-x> material, and the material has the advantages of large turn-on current, small leakage current, good thermal stability, simple material, no toxicity and the like when being used for a gating tube unit. According to the gating tube material, the doped material is doped into the GexS<1-x> material, so that the threshold voltage, the turn-on current, thefatigue characteristic and other properties of the gating tube unit made of the gating material can be adjusted and optimized. The thermal stability of the gating tube unit made of the gating materialcan be improved, the leakage current of the gating tube unit made of the gating material is reduced, and the repeatability of the gating tube unit made of the gating tube material is enhanced.