Goggles for power maintenance worker and manufacturing method of goggles
A technology for maintenance personnel and production methods, applied in the field of machinery, can solve problems such as inability to adjust sunlight transmittance, inconvenience for users, etc.
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Embodiment 1
[0066] The frame part 10, the electrochromic device 20 and the controller 30 are assembled.
[0067] Making the electrochromic device 20 includes:
[0068] (1)WO 3 Preparation of nano-film 5 material electrochromic electrode:
[0069] a. Magnetron sputtering fluorine-doped tin oxide (FTO) film 2 on the surface of tempered glass 1 with a specific size, the thickness is about 320nm;
[0070] b. Perform high temperature annealing treatment on it to obtain high-strength FTO conductive glass, and then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for use; then, use the magnetron sputtering method Plating W film on FTO glass with a thickness of 220nm; W film is used as WO 3 The growth source of nanowires;
[0071] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, and then add 3mol / L hydrochloric acid dropwise until no precipitation occurs. The precipitate is washed by centrifugation and dissolved in hydro...
Embodiment 2
[0086] The frame part 10, the electrochromic device 20 and the controller 30 are assembled.
[0087] Making the electrochromic device 20 includes:
[0088] (1)WO 3 Preparation of nano-film 5 material electrochromic electrode:
[0089] a. Magnetron sputtering fluorine-doped tin oxide (FTO) film 2 on the surface of tempered glass 1 with a specific size, the thickness is about 360nm;
[0090] b. Perform high temperature annealing treatment on it to obtain high-strength FTO conductive glass, and then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for use; then, use the magnetron sputtering method Plating W film on FTO glass with a thickness of 200nm; W film is used as WO 3 The growth source of nanowires;
[0091] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, and then add 3mol / L hydrochloric acid dropwise until no precipitation occurs. The precipitate is washed by centrifugation and dissolved in hydro...
Embodiment 3
[0106] The frame part 10, the electrochromic device 20 and the controller 30 are assembled.
[0107] Making the electrochromic device 20 includes:
[0108] (1)WO 3 Preparation of nano-film 5 material electrochromic electrode:
[0109] a. Magnetron sputtering fluorine-doped tin oxide (FTO) film on the surface of tempered glass 1 of specific size, the thickness is about 340nm;
[0110] b. Perform high temperature annealing treatment on it to obtain high-strength FTO conductive glass, and then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for use; then, use the magnetron sputtering method Plating W film on FTO glass with a thickness of 210nm; W film is used as WO 3 The growth source of nanowires;
[0111] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, and then add 3mol / L hydrochloric acid dropwise until no precipitation occurs. The precipitate is washed by centrifugation and dissolved in hydrogen pe...
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