Transparency-adjustable glass door and manufacturing method thereof
A manufacturing method and glass door technology, applied in the field of machinery, can solve the problem of not being able to adjust the transparency at will
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Embodiment 1
[0067] Assemble the glass door main body 10 , the electrochromic device 20 and the electric control module 30 .
[0068] Making the electrochromic device 20 includes:
[0069] (1) WO 3 Nano film 5 material electrochromic electrode preparation:
[0070] a. Magnetron sputtering a fluorine-doped tin oxide (FTO) film 2 on the surface of tempered glass 1 with a specific size, with a thickness of about 320nm;
[0071] b. Perform high-temperature annealing treatment on it to obtain FTO conductive glass with higher strength, then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for later use; then, use magnetron sputtering method Coating W film on FTO glass with a thickness of 220nm; W film is used as WO 3 a growth source for the nanowires;
[0072] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, then add 3mol / L hydrochloric acid dropwise until no precipitation occurs, and then dissolve the obta...
Embodiment 2
[0087] Assemble the glass door main body 10 , the electrochromic device 20 and the electric control module 30 .
[0088] Making the electrochromic device 20 includes:
[0089] (1) WO 3 Nano film 5 material electrochromic electrode preparation:
[0090] a. Magnetron sputtering fluorine-doped tin oxide (FTO) film 2 on the surface of tempered glass 1 with a specific size, with a thickness of about 360nm;
[0091]b. Perform high-temperature annealing treatment on it to obtain FTO conductive glass with higher strength, then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for later use; then, use magnetron sputtering method Coating W film on FTO glass with a thickness of 200nm; W film is used as WO 3 a growth source for the nanowires;
[0092] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, then add 3mol / L hydrochloric acid dropwise until no precipitation occurs, and then dissolve the obtaine...
Embodiment 3
[0107] Assemble the glass door main body 10 , the electrochromic device 20 and the electric control module 30 .
[0108] Making the electrochromic device 20 includes:
[0109] (1) WO 3 Nano film 5 material electrochromic electrode preparation:
[0110] a. Magnetron sputtering a fluorine-doped tin oxide (FTO) film on the surface of tempered glass 1 with a specific size, with a thickness of about 340nm;
[0111] b. Perform high-temperature annealing treatment on it to obtain FTO conductive glass with higher strength, then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for later use; then, use magnetron sputtering method Coating W film on FTO glass with a thickness of 210nm; W film is used as WO 3 a growth source for the nanowires;
[0112] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, then add 3mol / L hydrochloric acid dropwise until no precipitation occurs, and then dissolve the obtain...
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