Er-Yb-codoped A12O3-Ag bilayered upconversion luminescence thin film and preparation method thereof
A technology of luminescent film and double-layer film, which is applied in the field of photoluminescence and solar cells, can solve the problems affecting the enhancement of upconversion luminescence, and achieve the effect of enhancing the performance of upconversion luminescence, high repeatability and good process stability
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Embodiment 1
[0039] Preparation of Er﹑Yb co-doped Al 2 o 3 Thin film: Among them, Er: 0.8 mol%, Yb: 10 mol%. The substrate temperature is room temperature, the oxygen partial pressure in the sputtering gas accounts for 1.8% of the total gas pressure, the sputtering pressure is 0.8Pa, and the sputtering power density is 106kW / m 2 , the thickness of the film is 500nm, and it is annealed in air at 1000°C for 150min.
[0040] The pump source for measuring luminescence is a 980nm semiconductor laser with a power of 2W and incident on the surface of the film at an angle of 45°.
[0041] image 3 It is the upconversion luminescence spectrum of the thin film sample in Example 1 excited by the pump source.
Embodiment 2
[0043] Preparation of Er﹑Yb co-doped Al 2 o 3 / Ag double-layer film, in which, Er: 1mol%, Yb: 20mol%, Al 2 o 3 Other film preparation conditions are the same as in Example 1, and the film thickness is 500nm;
[0044] Preparation of Ag film: substrate temperature is room temperature, sputtering gas is argon, sputtering pressure is 0.6Pa, sputtering power density is 7.1kW / m 2 . Ag film thickness (a) 0nm, (b) 14nm.
[0045] Figure 4 It is the upconversion luminescence spectrum of the thin film sample in Example 2 excited by the pump source.
Embodiment 3
[0047] Preparation of Er﹑Yb co-doped Al 2 o 3 / Ag bilayer film, in which, Er: 0.5mol%, Yb: 5mol%, Al 2 o 3 Other film preparation conditions are the same as in Example 1, and the film thickness is 500nm;
[0048] Preparation of Ag film: substrate temperature is room temperature, sputtering gas is argon, sputtering pressure is 0.6Pa, sputtering power density is 5.3kW / m 2 . Ag film thickness (a) 0nm, (b) 14nm.
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