Method and device for treating chlorosilane tail gas

A technology for tail gas treatment and chlorosilane, applied in the direction of halosilane, separation methods, chemical instruments and methods, etc., can solve environmental pollution, the production cost of polysilicon enterprises is not competitive, increase the consumption of raw silicon powder and liquid chlorine, etc. , to achieve the effect of less investment, improving the utilization rate of water resources and reducing water pollution

Inactive Publication Date: 2016-02-03
NANJING DUBLE METAL EQUIP ENG
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  • Abstract
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AI Technical Summary

Problems solved by technology

If these silicon tetrachlorides are simply hydrolyzed or even discharged directly, it will cause huge pollution to environmental protection, and also greatly increase the consumption of raw silicon powder and liquid chlorine, and the production cost of polysilicon enterprises will not be competitive

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  • Method and device for treating chlorosilane tail gas
  • Method and device for treating chlorosilane tail gas
  • Method and device for treating chlorosilane tail gas

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specific Embodiment approach

[0032] Such as figure 1 Shown is the main process flow of the present invention-a method for treating chlorosilane tail gas. The treated chlorosilane tail gas is the tail gas containing a large amount of silicon tetrachloride, trichlorosilane and polysilane produced in the polysilicon reduction process section. ;The tail gas treatment capacity of the whole tail gas can reach 8000Nm3 / h, the chlorosilane contained in the tail gas is 1250kg / h, and the others are non-condensable gases. The treatment process includes the following steps: the tail gas 100 containing chlorosilanes passes through 1) waste gas condensation pretreatment stage 2, the temperature of the chlorosilane gases contained in the waste gas is reduced below the boiling point, so that most of the chlorosilane gases in the tail gas are transformed from gaseous state The chlorosilane liquid 101 in liquid state is stored for later use; the remaining uncondensed tail gas and other non-condensable gases are processed in...

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Abstract

The invention provides a method for treating chlorosilane tail gas. The method comprises the following steps : 1) at an exhaust gas condensation pretreatment stage, causing exhaust gas at a chlorosilane leaching stage to enter a primary leaching tower to remove acid gas; lowering the temperature of chlorosilane gas contained in the exhaust gas to below the boiling point, transforming most of chlorosilane gas in the tail gas from a gaseous state to a liquid state; causing remaining non-condensable gas, such as the non-condensed tail gas, to enter a next stage to be treated; causing condensed liquid chlorosilane into a chlorosilane condensate storage tank, pressurizing the liquid chlorosilane through a condensate conveying pump and then conveying the liquid chlorosilane to a hydrogenation storage tank to be stored for standby application; 2) at the chlorosilane leaching stage, causing the tail gas having undergone condensing pretreatment to undergo secondary leaching to remove most of acid gas, collecting the non-condensable gas in the remaining tail gas, such as hydrogen and nitrogen, for standby application; and causing leached waste water to undergo treatment in a next stage; and 3) at a waste water treatment stage, causing the leached waste water to undergo a neutral reaction to be settled to be solid sludge to be discharged.

Description

technical field [0001] The invention relates to the field of polysilicon tail gas treatment, in particular to a chlorosilane tail gas treatment method and device. Background technique [0002] The production of polysilicon is often produced by the improved Siemens method, and its main by-product is silicon tetrachloride. For every ton of photovoltaic polysilicon produced, 10 to 20 tons of silicon tetrachloride is produced by-product, among which silicon tetrachloride undergoes cold hydrogenation (the reaction temperature is also above 450 degrees Celsius) and then synthesizes trichlorosilane for reuse. After treatment, exhaust gas containing chlorosilane will also be produced, and silicon tetrachloride will decompose into silicic acid and highly toxic gas hydrogen chloride when it encounters humid air, which is highly irritating to human eyes, skin, and respiratory tract. If these silicon tetrachlorides are simply hydrolyzed or even discharged directly, it will cause huge p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/00B01D53/14B01D53/18C02F9/04C02F1/66C01B33/107
Inventor 黄鹏黄莉郭飞顾晓华翟继军张国超
Owner NANJING DUBLE METAL EQUIP ENG
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