Counter electrode for quantum dot-sensitized solar cells and preparation method thereof
A solar cell and quantum dot sensitization technology, which is applied in the field of solar energy utilization and nanomaterials, can solve the problems of poor electrode stability, high electrode cost, and low catalytic performance, and achieve good adhesion, low cost, and high catalytic activity. Effect
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Embodiment 1
[0028] (1) Preparation of Pb x Cu 1-x S counter electrode
[0029] 1) Clean the substrate
[0030] Put the FTO conductive glass substrate into ethanol, acetone and deionized water with detergent for 15 minutes to remove the dust and grease on the surface of the substrate, and then put it into deionized water for 15 minutes to wash away the dirt. detergent and some inorganic pollutants, rinse with deionized water for 15 minutes, and finally blow dry with nitrogen for later use.
[0031] 2) Preparation of chemical bath deposition solution
[0032] Dissolve 4.74 g (12.5 mmol) of lead acetate, 2 g (50 mmol) of sodium hydroxide, 1.52 g (20 mmol) of thiourea, and 1.49 g (10 mmol) of triethanolamine in 400 ml of deionized water, and stir to form a solution a. Dissolve 0.64 g (3.75 mmol) of copper chloride and 1.19 g (8 mmol) of triethanolamine in 100 ml of deionized water and stir well to form solution B. Then solution A was slowly added to solution B under stirring conditions, a...
Embodiment 2
[0040] (1) Preparation of Pb x Cu 1-x S counter electrode
[0041] 1) Clean the substrate
[0042] With embodiment 1.
[0043] 2) Preparation of chemical bath deposition solution
[0044] With embodiment 1.
[0045] 3) Deposit Pb on the surface of conductive glass substrate x Cu 1-x S counter electrode
[0046] Fix the cleaned FTO conductive glass substrate on a special fixture, then immerse the substrate vertically in the deposition solution, seal the beaker containing the solution with aluminum foil, and place it on a magnetic stirrer at room temperature for deposition reaction, deposition 4 After an hour, take out the FTO substrate, rinse it with deionized water, and dry it in an oven for use. Use a scanning electron microscope to test its thickness to be 324 nm. This electrode is named Pb x Cu 1-x S-4.
[0047] (2) Preparation of porous TiO sensitized by CdSe quantum dots 2 Photoanode (TiO 2 / CdSe)
[0048] With embodiment 1.
[0049] (3) Assemble and test qu...
Embodiment 3
[0052] (1) Preparation of Pb x Cu 1-x S counter electrode
[0053] 1) Clean the substrate
[0054] With embodiment 1.
[0055] 2) Preparation of chemical bath deposition solution
[0056] With embodiment 1.
[0057] 3) Deposit Pb on the surface of conductive glass substrate x Cu 1-x S counter electrode
[0058] Fix the cleaned FTO conductive glass substrate on a special fixture, then immerse the substrate vertically in the deposition solution, seal the beaker containing the solution with aluminum foil, and place it on a magnetic stirrer at room temperature for deposition reaction, deposition 7 After an hour, take out the FTO substrate, rinse it with deionized water, and dry it in an oven for later use. The thickness of the electrode is 582 nm as measured by a scanning electron microscope. This electrode is named Pb x Cu 1-x S-7.
[0059] (2) Preparation of porous TiO sensitized by CdSe quantum dots 2 Photoanode (TiO 2 / CdSe)
[0060] With embodiment 1.
[0061] (...
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