A kind of preparation method of nickel-plated graphene/silver-nickel electric contact material
A technology of electric contact material and nickel-plated graphite, which is applied in the direction of circuits, electric switches, electrical components, etc., can solve problems such as difficult to meet environmental protection requirements, and achieve the effects of easy control of the deposition process, high conductivity, and increased hardness
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Embodiment 1
[0021] (1) Nickel-coated graphene was prepared by depositing metallic nickel on the surface of graphene (1-10 layers) by DC magnetron sputtering. The nickel target with a purity of 99.99% was polished with fine sandpaper before installation to remove the surface oxide film, then cleaned with acetone, dried, and pre-sputtered for 5 minutes before deposition by DC magnetron sputtering. Graphene separates, removes metal oxides and other impurities on the target surface, and ensures the purity of the nickel film deposited on the subsequent graphene surface. The sputtering parameters are as follows: the vacuum degree reaches 0.1*10 -3 At Pa, argon gas with a purity of 99.99% was introduced, the vacuum chamber pressure was 0.8Pa, the sputtering power was 120W, and the deposition time was 5min.
[0022] (2) Nickel-plated graphene: nickel powder: silver powder is loaded into the ball mill at a weight ratio of 0.1:10:89.9, using alumina ball ink tanks and agate balls, and the ball-to-...
Embodiment 2
[0026] (1) Nickel-coated graphene was prepared by depositing metallic nickel on the surface of graphene (1-10 layers) by DC magnetron sputtering. The nickel target with a purity of 99.99% was polished with fine sandpaper before installation to remove the surface oxide film, then cleaned with acetone, dried, and pre-sputtered for 5 minutes before deposition by DC magnetron sputtering. Graphene separates, removes metal oxides and other impurities on the target surface, and ensures the purity of the nickel film deposited on the subsequent graphene surface. The sputtering parameters are as follows: the vacuum degree reaches 1.0*10 -3 At Pa, argon gas with a purity of 99.99% was introduced, the vacuum chamber pressure was 1.2Pa, the sputtering power was 80W, and the deposition time was 20min.
[0027] (2) Nickel-plated graphene: nickel powder: silver powder is loaded into the ball mill at a weight ratio of 5:40:55, using alumina ball ink tanks and agate balls, and the ball-to-mate...
Embodiment 3
[0031] (1) Nickel-coated graphene was prepared by depositing metallic nickel on the surface of graphene (1-10 layers) by DC magnetron sputtering. The nickel target with a purity of 99.99% was polished with fine sandpaper before installation to remove the surface oxide film, then cleaned with acetone, dried, and pre-sputtered for 5 minutes before deposition by DC magnetron sputtering. Graphene separates, removes metal oxides and other impurities on the target surface, and ensures the purity of the nickel film deposited on the subsequent graphene surface. The sputtering parameters are as follows: the vacuum degree reaches 0.3*10 -3 At Pa, argon gas with a purity of 99.99% was introduced, the vacuum chamber pressure was 1.0Pa, the sputtering power was 110W, and the deposition time was 5min.
[0032] (2) Nickel-plated graphene: nickel powder: silver powder is loaded into the ball mill at a weight ratio of 2:10:88, using alumina ball ink tanks and agate balls, and the ball-to-mate...
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