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Silicon tetrafluoride purifying method

A technology of silicon tetrafluoride and purification method, applied in halogenated silicon compounds, chemical instruments and methods, halogenated silanes, etc., can solve the problems of high requirements for production equipment, high production cost, low temperature and the like

Active Publication Date: 2016-05-11
PERIC SPECIAL GASES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The temperature required for the purification method is low, the requirements for production equipment are relatively high, and the relative production cost is relatively high

Method used

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  • Silicon tetrafluoride purifying method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～27

[0078] In the purification method of following embodiment 1~27 silicon tetrafluorides:

[0079] The purification apparatus used is as follows:

[0080]A purification device for silicon tetrafluoride, the purification device is made of Monel alloy, the reaction chamber has a volume of 5L, is equipped with a heating tile and a cooling jacket, the diameter of the reaction chamber is 100mm, and is connected with a dilution medium inlet pipe. If it is necessary to use a catalyst, the catalyst can be placed in the reaction chamber before the purification reaction, and if it is necessary to use a dilution medium, the dilution medium can be added through the dilution medium inlet pipe during the purification reaction. During the reaction, the reactor passes through a feed pipe, feeds the crude silicon tetrafluoride gas, and feeds the purified reactant 1 through another feed pipe. Under a certain temperature and pressure, the impurities in the crude silicon tetrafluoride gas react with...

Embodiment 1

[0096] A kind of purification method of silicon tetrafluoride, described purification method is as follows:

[0097] (1) supply silicon tetrafluoride crude product gas 200g to the reaction chamber of purifying device by feed pipe, supply purification reactant 1 carbonyl fluoride to reaction chamber by feed pipe, silicon tetrafluoride crude product gas and purification reactant 1 carry out Purification reaction, the reaction percentage 1 is 99%, the reaction temperature of the reaction chamber is 1999 ° C, the reaction pressure is 2 MPa, no dilution medium is used, no catalyst is used, and the obtained product is collected by a cold trap at -110 ° C to obtain purified tetrafluoroethylene silicon dioxide gas;

[0098] (2) the silicon tetrafluoride gas of the purification that step (1) obtains and purification reactant 2SiO 2 Carry out the purification reaction, the reaction percentage 2 is 20%, the reaction temperature in the reaction chamber is 1999°C, and the reaction pressur...

Embodiment 2

[0104] A kind of purification method of silicon tetrafluoride, described purification method is as follows:

[0105] (1) Reaction temperature is-199 DEG C, reaction pressure is-0.09MPa, reaction percentage 1 is 0.0001%, all the other are with embodiment 1 step (1).

[0106] (2) Purify by freezing and vacuuming, and the rest are the same as step (2) in Example 1.

[0107] The silicon tetrafluoride refined gas is tested and analyzed, and it can be seen that:

[0108] SiF 4 The purity of ≥99.9995%;

[0109] Impurities and content: (SiF 3 ) 2 O≤0.1ppm, CH 4 ≤0.1ppm, C 2 h 6 ≤0.1ppm, C 3 h 8 ≤0.1ppm, C 2 h 2 ≤0.1ppm, C 2 h 4 ≤0.1ppm, CO≤0.1ppm, H 2 ≤0.1ppm, B≤0.1ppm, P≤0.1ppm, As≤0.1ppm, Se≤0.1ppm, H 2 S≤0.1ppm, SO 2 ≤0.1ppm, N 2 O ≤ 0.1ppm, each metal ≤ 0.1ppm, O 2 ≤0.5ppm, N 2 ≤1ppm, CO 2 ≤1ppm, HF≤0.1ppm and HCl≤0.1ppm, other impurities were not detected;

[0110] The metals are: lithium, beryllium, sodium, magnesium, aluminum, potassium, calcium, titanium, va...

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Abstract

The invention relates to a silicon tetrafluoride purifying method and belongs to the field of fluorochemical industry and electronic industry gas. The method includes: subjecting silicon tetrafluoride crude product gas and a purifying reactant 1 to purifying reaction to obtain purified silicon tetrafluoride gas, wherein the purifying reactant 1 is a substance containing fluorine atoms and / or chlorine atoms, temperature at which the purifying reaction occurs is minus 199-1999 DEG C, and when the purifying reactant 1 is F2, the temperature is minus 99-99 DEG C; pressure at which the purifying reaction occurs is minus 0.09-2MPa, and the silicon tetrafluoride crude product gas can be in purifying reaction with a purifying reactant 2 to obtain silicon tetrafluoride higher in purity. The silicon tetrafluoride purifying method is easy in obtaining high-purity silicon tetrafluoride, high in yield and safety and low in cost.

Description

technical field [0001] The invention relates to a method for purifying silicon tetrafluoride, which belongs to the fields of fluorine chemical industry and electronic industry gas. Background technique [0002] Silicon tetrafluoride (SiF 4 ) is mainly used in the electronics and semiconductor industries as etchant for silicon nitride, tantalum silicide, etc., P-type dopant, epitaxial deposition diffusion silicon source, etc., and can also be used to prepare electronic grade silane or silicon. Silicon tetrafluoride can also be used as a raw material for high-purity quartz glass for optical fibers. It can be hydrolyzed in a high-temperature flame to produce heat-sinking silicon dioxide (SiO2) with a high specific surface area. 2 ). In addition, silicon tetrafluoride is also widely used in the preparation of solar cells, fluorosilicic acid, aluminum fluoride, chemical analysis, fluorinating agents, oil well drilling, magnesium alloy casting, catalysts, fumigants, hardeners fo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCC01B33/10705C01B2210/0003C01B2210/0043
Inventor 蒋玉贵孟祥军李翔宇董云海乔蓓蓓沙婷杨庆平
Owner PERIC SPECIAL GASES CO LTD
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