Method for improving water flux and anti-pollution capacity of polyamide reverse osmosis membrane
A technology of reverse osmosis membrane and polyamide, which is used in osmosis/dialysis water/sewage treatment, semi-permeable membrane separation, water/sewage treatment, etc., can solve the problem of low water flux and poor anti-pollution ability of polyamide composite reverse osmosis membrane and other problems, to achieve the effect of strong anti-pollution ability and improved water flux
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Embodiment 1
[0014] Dissolve 20 parts by weight of polysulfone (P3500) in N-N, dimethylacetamide solution, add 0.2 parts of sodium dodecylsulfonate, mix well, apply it on the surface of non-woven fabric, immerse in water, remove solvent to obtain a porous support layer. The polysulfone support layer was immersed in 3% hydrogen peroxide solution, and treated with ultraviolet light for 10 minutes. Rinse the surface of the support layer repeatedly with deionized water, and after air-drying, immerse it in an aqueous solution with a concentration of m-phenylenediamine of 2%, and contact for 40s to form an aqueous phase liquid layer on the surface of the porous support layer to obtain a wet film; immerse the wet film in In the naphtha organic solution containing 0.05% trimellitic acid chloride, contact with it for 30s, interfacial polymerization reaction occurs with it, dry in an oven at 100°C for 2min, wash with deionized water several times, and obtain the treated polyamide composite Reverse ...
Embodiment 2
[0016] Dissolve 20 parts by weight of polysulfone (P3500) in N-N, dimethylacetamide solution, add 0.2 parts of sodium dodecylsulfonate, mix well, apply it on the surface of non-woven fabric, immerse in water, remove solvent to obtain a porous support layer. Rinse the surface of the support layer repeatedly with deionized water, and after air-drying, immerse it in an aqueous solution with a concentration of m-phenylenediamine of 2%, and contact for 40s to form an aqueous phase liquid layer on the surface of the porous support layer to obtain a wet film; immerse the wet film in In the naphtha organic solution containing 0.05% trimellitic acid chloride, contact with it for 30s, interfacial polymerization reaction occurs with it, dry in an oven at 100°C for 2 minutes, and wash with deionized water several times to obtain the treated polyamide Composite reverse osmosis membrane. Immerse the polyamide composite reverse osmosis membrane in an aqueous solution with a sodium sulfate c...
Embodiment 3
[0018] Dissolve 20 parts by weight of polysulfone (P3500) in N-N, dimethylacetamide solution, add 0.2 parts of sodium dodecylsulfonate, mix well, apply it on the surface of non-woven fabric, immerse in water, remove solvent to obtain a porous support layer. The polysulfone support layer was immersed in 3% hydrogen peroxide solution, and treated with ultraviolet light for 10 minutes. Wash it several times with deionized water, and after air-drying, immerse it in an aqueous solution with a concentration of m-phenylenediamine of 2%, and contact it for 40 seconds to form an aqueous phase liquid layer on the surface of the porous support layer to obtain a wet film; In the naphtha organic solution of 0.05% phenyltrimethyl acid chloride, contact with it for 30s, and interfacial polymerization reaction occurs with it, after drying in an oven at 100°C for 2 minutes, wash it several times with deionized water, and obtain the polyamide composite reaction after treatment. permeable membr...
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