Manufacturing method of light-emitting diode
A technology for light-emitting diodes and a manufacturing method, which is applied in the fields of semiconductor/solid-state device manufacturing, electrical components, and electrical solid-state devices, etc., can solve the problem of loss of reliability of high-voltage and high-power light-emitting diodes, reducing the life cycle of LED modules, and lengthy wire bonding and welding. Cost and other issues, to achieve the effect of reducing production cost, reducing resistance value and wire power consumption, and improving yield
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[0057] Example: A method for manufacturing light-emitting diodes disclosed in the present invention includes the following steps. Steps (1)-(7) are the same as the prior art. (1) ICP dry etching or laser cutting is used on the wafer Make a cutting channel on the sapphire crystal garden substrate to isolate each LED chip, such as image 3 Shown
[0058] (2) Growing 300nm thick SiO on the surface by PECVD 2 The thin film serves as a shielding layer for etching GaN, such as Figure 4 Shown
[0059] (3) Obtained by etching GaN with an ICP high-density plasma etching machine Figure 5 Mesa structure shown;
[0060] (4) Grow transparent electrodes Ni / Au on p-type GaN (e.g. Image 6 Shown);
[0061] (5) Using lift-off process to simultaneously form ohm contacts and solder pads on Ni / Au transparent electrodes and n-type GaN, refer to the side structure of ohmic contacts and solder pads Figure 7 As shown, the front view of the pad area is as Figure 8 As shown, 13 indicates the pad position, ...
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