Composition for preparing semiconductor electrothermal film, electrothermal film and preparation method
An electric heating film and semiconductor technology, applied in the field of preparing semiconductor electric heating film compositions, can solve the problems of insufficient bonding between the electric heating film and the substrate, insufficient stability of the electric heating film, and difficulty in controlling the sheet resistance, so as to achieve stable electrothermal conversion performance, High resistance to thermal shock and thermal stress, good thermal stability
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Embodiment 1
[0030] 15 parts of tin tetrachloride, 10 parts of nickel tetrachloride, 10 parts of graphite, 6 parts of antimony trichloride, 0.2 part of titanium tetrachloride, 0.2 part of antimony trioxide, 0.2 part of fullerene, 0.1 part of boric acid, fluorine 1.5 parts of boric acid, 0.3 parts of sodium chloride, 3 parts of water, 2 parts of toluene, 40 parts of ethanol.
Embodiment 2
[0032] 20 parts of tin tetrachloride, 6 parts of nickel tetrachloride, 12 parts of graphite, 3 parts of antimony trichloride, 0.4 parts of titanium tetrachloride, 0.6 parts of antimony trioxide, 0.3 parts of fullerene, 1.5 parts of boric acid, fluorine 0.1 part of boric acid, 0.5 part of sodium chloride, 6 parts of water, 4 parts of toluene, 50 parts of ethanol.
Embodiment 3
[0034] 16 parts of tin tetrachloride, 7 parts of nickel tetrachloride, 15 parts of graphite, 4 parts of antimony trichloride, 0.2 parts of titanium tetrachloride, 0.5 parts of antimony trioxide, 0.8 parts of fullerene, 1.2 parts of boric acid, fluorine 0.5 parts of boric acid, 0.5 parts of sodium chloride, 4 parts of water, 3 parts of toluene, 30 parts of ethanol.
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