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Mixing absorption type infrared cut-off filter and preparation method thereof

An infrared cut-off and infrared cut-off film technology, applied in optical filters, optical filters for photography, optics, etc., can solve the high cost and limited resources, the shortage of blue glass raw materials, the difficulty of processing technology, and the high production cost of BGFilter and other problems, to achieve the effect of facilitating large-scale, reducing production costs and improving cutting efficiency

Inactive Publication Date: 2016-08-31
ZHEJIANG CRYSTAL OPTECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the growing market of blue glass filters corresponds to high cost and limited resources. Due to the shortage of blue glass raw materials and the difficulty of processing technology, the market is facing the embarrassing situation of high production costs of BG Filter.

Method used

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  • Mixing absorption type infrared cut-off filter and preparation method thereof
  • Mixing absorption type infrared cut-off filter and preparation method thereof
  • Mixing absorption type infrared cut-off filter and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment approach

[0031] Such as figure 1 As shown, a mixed absorption infrared cut-off filter is composed of a glass substrate 3 (D263T colorless borosilicate glass), a coating adhesive layer 2 , an anti-reflection film layer 1 and an infrared cut-off film layer 4 . The thickness of the glass substrate is between 0.1mm and 1.0mm, and the commonly used specifications are 0.11mm, 0.21mm, 0.3mm, 0.45mm, 0.7mm, and 1.0mm. The visible light absorption band of the coating glue layer (the glue for coating glue is commercially available from Nippon Shokubai Co., Ltd., model: IX-2-GQ-AE2) is 380-760 nm, and the highest light transmittance T>90%. The coating thickness ranges from 5-100μm. The coating adhesive layer has absorption characteristics in the visible light band (380-760nm), and the use of this absorption characteristic greatly reduces the edge chromatic aberration problem caused by the angle effect. The number of anti-reflection coating layers is 4-7 layers, and the thickness of the anti-ref...

Embodiment 1

[0038] Curve requirements for a hybrid infrared cut filter: average transmittance T in the visible light band 440-550nm ave >93%, IR center cut-off wavelength T 50％ =660±5, 0-30°center offsetave ave max <1%.

[0039]Thickness T = 0.21mm, size Φ = 150mm glass substrate is ultrasonically cleaned, dried and put into the glue homogenizer. Bake in a nitrogen oven with an adjustable flow rate, the nitrogen flow rate is 20-40sccm, take out the measurement after the baking time is 40-80min, and confirm that the coated substrate meets the design requirements.

[0040] Electron gun evaporation and ion source assisted method are used to deposit anti-reflection film layer and infrared cut film layer, in which the evaporation rate of high refractive index material layer is 2-4A / s, and the evaporation rate of low refractive index material layer is 10-14A / s, ion source assisted The voltage BV value is 350-800V, the constant temperature of the substrate is 180-220°C, and the time is 40-80mi...

Embodiment 2

[0043] Curve requirements for a hybrid infrared cut filter: average transmittance T in the visible light band 440-550nm ave >93%, IR center cut-off wavelength T 50％ =650±5, 0-30°center offsetave ave max <1%.

[0044] Thickness T = 0.21mm, size Φ = 150mm glass substrate is ultrasonically cleaned, dried and put into the glue homogenizer. Bake in a nitrogen oven with an adjustable flow rate, the nitrogen flow rate is 20-40sccm, take out the measurement after the baking time is 40-80min, and confirm that the coated substrate meets the design requirements.

[0045] Electron gun evaporation and ion source assisted method are used to deposit anti-reflection film layer and infrared cut film layer, in which the evaporation rate of high refractive index material layer is 2-4A / s, and the evaporation rate of low refractive index material layer is 10-14A / s, ion source assisted The voltage BV value is 350-1100V, the constant temperature of the substrate is 130-180°C, and the time is 40-80...

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Abstract

The invention discloses a mixing absorption type infrared cut-off filter and a preparation method thereof. The mixing absorption type infrared cut-off filter comprises a glass substrate; the upper surface of the glass substrate is provided with a coating adhesive layer possessing visible light absorption characteristics; the coating adhesive layer is provided with an antireflection film layer; the lower surface of the glass substrate is provided with an infrared cut-off film layer. The invention provides a visible region high transmittance and infrared band cut-off ultralow angle effect filter, which can realize lower edge aberration in wide angle incidence.

Description

technical field [0001] The invention relates to the technical field of filter production, in particular to a mixed-absorption infrared cut-off filter and a preparation method thereof. Background technique [0002] Blue glass is a colored glass with the property of absorbing infrared rays, the main component is phosphate substances, and it has an important application in the field of digital optical filters. The blue glass filter is an absorption filter. Compared with the ordinary interference infrared cut filter, it effectively reduces the chromatic aberration of the transmitted light and the "ghost" of the scattered light, and its transmission and reflection curve has a large impact on the There is very little angular dependence. Based on these advantages, blue glass filters are favored by manufacturers and consumers who have high imaging requirements. [0003] In the past, blue glass filters were mainly used in high-end products such as digital cameras / SLRs. Now, with th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/22G02B5/20G02B1/10G02B1/11G03B11/00
CPCG03B11/00G02B1/10G02B1/115G02B5/208G02B5/22
Inventor 谭耀成张睿智林正坤彭建宾洪军可林霄
Owner ZHEJIANG CRYSTAL OPTECH
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