Aluminum oxide base polishing solution for sapphire substrate polishing and preparation method thereof

A technology of alumina and polishing liquid, applied in polishing compositions containing abrasives, etc.

Inactive Publication Date: 2016-09-21
苏州溶煋新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the hardness, particle size and aggregation and dispersion state of the abrasive silica itself, the grinding efficiency is low and the polishing time is long, especially for the double-sided polishing of window sapphire, which is inefficient and cannot be used in actual production.
There are also some alumina-based sapphire polishing fluid reports, such as CN201410158996, CN2014108378244, etc., but in practical applications, it is difficult to achieve continuous production due to the fluidity of the slurry and its easy deposition in the pipeline system
[0003] In order to overcome the defects that the polishing liquid polishing efficiency is low and the polishing effect is not ideal in the prior art, the purpose of the present invention is to develop a kind of alumina-based aqueous dispersion, It has small particle size, good fluidity, good redispersibility and is not easy to deposit alumina slurry, high polishing efficiency, good surface quality, roughness and flatness can meet the requirements of substrates and windows

Method used

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  • Aluminum oxide base polishing solution for sapphire substrate polishing and preparation method thereof
  • Aluminum oxide base polishing solution for sapphire substrate polishing and preparation method thereof
  • Aluminum oxide base polishing solution for sapphire substrate polishing and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0022] 1) Add 300g of 3μm ɑ-type alumina powder and 10g of boehmite powder into 650ml of deionized water at a constant speed, disperse at high speed at 1000rpm for 20 minutes to form a uniform slurry, and add triethanolamine to adjust the pH value to 10.5, and then adjust the pH value to 11.5 with potassium hydroxide; 2) Use 0.5mm yttrium-stabilized zirconia ball milling beads, and enter the sand mill at a flow rate of 5kg / min for ball milling until the average particle size is 0.1-0.5μm; 3) Continue to adjust the pH to 12 with potassium hydroxide; 4) Finally, filter and fill the slurry with a 500-mesh filter bag.

Embodiment 2

[0024] 1) Add 300g of 3μm ɑ-type alumina powder and 10g of boehmite powder into 650ml of deionized water at a constant speed and disperse at high speed at 1000rpm for 20 minutes to form a uniform slurry, slowly add 3g of dispersant organic Phosphoric acid PBTCA, continue to stir for 20 minutes, add triethanolamine to adjust the pH value to 10.5, and then use potassium hydroxide to adjust the pH value to 11.5; 2) Use 0.5mm yttrium-stabilized zirconia ball milling beads, and enter the sand mill at a flow rate of 5kg / min for ball milling , until the average particle size is 0.1-0.5um; 3) Continue to adjust the pH to 12 with potassium hydroxide; 4) Finally, filter and fill the slurry with a 500-mesh filter bag.

Embodiment 3

[0026] 1) Add 100g of 3μm ɑ-type alumina powder and 20g of boehmite powder into 850ml of deionized water at a constant speed and disperse at high speed at 1000rpm for 20 minutes to form a uniform slurry, slowly add 2g of dispersant organic Phosphoric acid PBTCA, continue to stir for 20 minutes, add triethanolamine to adjust the pH value to 10.5, and then use potassium hydroxide to adjust the pH value to 11.5; 2) Use 0.5mm yttrium-stabilized zirconia ball milling beads, and enter the sand mill at a flow rate of 5kg / min for ball milling , until the average particle size is 0.1-0.5 μm; 3) Continue to adjust the pH to 12 with potassium hydroxide; 4) Finally, filter and fill the slurry with a 500-mesh filter bag.

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Abstract

The invention discloses a polishing solution of an aluminum oxide base sapphire substrate or a sapphire window piece. The polishing solution is characterized in that an alpha-type aluminum oxide grinding material with the specification of 0.01-1.5 micrometers, a dispersing agent containing organic phosphoric micromolecules, a builder, one or more organic solvents and antifoaming agents and the like are adopted, and the pH value is 10-14. The polishing solution has the better suspension dispersibility and mobility, and the high polishing efficiency, finish degree and roughness and can meet the technical requirement of polishing of the sapphire substrate material and the window piece.

Description

technical field [0001] The invention relates to an alumina-based polishing liquid for polishing a sapphire substrate and a preparation method thereof. Background technique [0002] Sapphire (Al 2 o 3 , Sapphire) is the main substrate material for the manufacture of GaN epitaxial light-emitting layers. It has a hexagonal lattice structure, and the commonly used facets are A-plane, C-plane, and R-plane. Because sapphire has a wide optical penetration band and has good light transmission from near ultraviolet to mid-infrared, it is widely used in optical components, infrared devices, lasers and photomask materials. Corrosion, high hardness, high melting point, etc., but because its hardness is second only to diamond, it is very difficult to grind and polish. The traditional sapphire polishing liquid is silicon oxide-based, such as CN201410562946, which is characterized by high solid content and cheap price. The surface quality of surface polishing is good, and it is widely u...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 宋伟红宋建伟杨磊丁小俊
Owner 苏州溶煋新材料科技有限公司
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