Preparation and fast light control method for nano pattern based on organic polymer

[0043] Example 1

[0044]

[0045] 1. Preparation of the phase separation structure: dissolve the block polymer 1 obtained by polymerization in an organic solvent solution such as toluene or tetrahydrofuran to obtain a homogeneous clear solution, which is fully dissolved and filtered. The polymer film is formed on the clean substrate by spin coating or bar coating. After the polymer film is annealed, a regular and orderly nanophase separation structure can be obtained. The structure generally has a diameter of 5-30 nanometers and a period of 10-100 nanometers. The distribution structure generally has a strip shape or a dot shape. As the main object of rapid control, the strip shape is arranged alternately and parallel between different phases. The specific shape is as Figure 5 (a), Image 6 (a) Shown.

[0046] 2. Ultraviolet light response: Under certain conditions, such as room temperature, this kind of film can rapidly change the nano pattern when irradiated under ultraviolet light, from in-plane arrangement to regular hexagonal point-like out-of-plane distribution. figure 2 with Figure 4 The UV absorption change caused by the trans-cis isomerization process of the azophenyl group in this example is expressed. The maximum absorption peak at 336nm gradually decreases after UV light and the absorption peak appears at 446nm, indicating that the photo-crosslinking functional group π- The π-conjugated structure is broken, and the azobenzene structure changes from trans to cis. The photoresponse process can be completed in 5s under ultraviolet light, and the absorption spectrum will not change after further irradiation. It can gradually recover under visible light conditions. After 4 hours of recovery, the absorption peak at 446nm drops to disappear, and the absorption peak at 336nm returns. It shows that cis-azobenzene gradually transforms into trans-structure under visible light conditions. High temperature annealing can re-arrange the molecular structure. The UV absorption spectrum shows that the rearrangement of the polymer chain at high temperature makes the arrangement of the azobenzene trans groups more regular, and the absorption peaks are more disorderly arranged. There is a significant drop, such as image 3 As shown, it provides a basis for the reversible regulation of nano patterns.

[0047] 3. The regulation of nano-patterns by ultraviolet light: After ultraviolet light is applied to the annealed polymer film, it can be found that the phase structure of either the out-of-plane arrangement or the in-plane arrangement will undergo certain changes, such as Figure 5 with Image 6 Shown. Among them, the response of the in-plane arrangement is more obvious, and obvious changes can be seen after 2s of irradiation. The black optically inert discontinuous phase part is split into a dot structure driven by the yellow light response continuous phase change. As the illumination progresses, the discontinuous phase changes continue, and the adjustment is basically completed after 10s. The response of the nano pattern under visible light conditions will have a certain recovery, because the light response chain recovers under visible light conditions to drive the corresponding changes in the phase structure, such as Figure 5 (e), Image 6 (d). After heat treatment, the polymer chains are rearranged, and the nano-pattern returns to the original structure, such as Figure 5 As shown in (f), the reversible regulation of the nano pattern is realized.

[0048] 4. Regulation of large-area nano-patterns: use a mask to cover the surface of the annealed nano-patterns, and then apply ultraviolet light or direct light with an interference light source to obtain a controllable pattern morphology, and the parts that have not been exposed to ultraviolet light retain the original structure ,Such as Figure 7 (a) Shown. Part of the ultraviolet light is transformed into dot-like nano patterns arranged out-of-plane, such as Figure 7 (b) Shown. A clear pattern boundary can be seen at the lighting boundary, such as Figure 7 (c) Shown. in Figure 7 (c) The upper left part is the unlit area, which is a linearly arranged dot structure (after zooming in as Figure 7 As shown in (d)), it belongs to the transition zone from the linear structure arranged in the plane to the regular hexagonal point-like out-of-plane arrangement, indicating that the direct factor of the discontinuous phase is not the light, although the ultraviolet light cannot reach the shielded part , The phase change process of the continuous phase will still squeeze the nearby surrounding area to cause it to change accordingly (such as Figure 7 Shows the regulation of nanostructures formed by light inert parts). in Figure 7 The lower right part of (c) is a standard hexagonal dot pattern structure with a period of about 20 nm. The formation of this pattern is due to the volume change of the continuous phase under the influence of light, which promotes the adjustment of the phase separation structure.

[0049] Example 2

[0050]

[0051] 1. Preparation of phase separation structure: Polymer 2 is used to prepare a polymer film, and the preparation method is the same as in Example 1.

[0052] 2. Ultraviolet light response: the same as in Example 1.

[0053] 3. The regulation of the nano pattern by ultraviolet light: the same as in Example 1.

[0054] 4. Regulation of large-area nanopatterns: the same as in Example 1.

[0055] Example 3

[0056]

[0057] 1. Preparation of phase separation structure: Polymer 3 is used to prepare a polymer film, and the preparation method is the same as in Example 1.

[0058] 2. Ultraviolet light response: the same as in Example 1.

[0059] 3. The regulation of the nano pattern by ultraviolet light: the same as in Example 1.

[0060] 4. Regulation of large-area nano-patterns: same as Example 1.