Preparation and fast light control method for nano pattern based on organic polymer
A nano-pattern and polymer technology, applied in photosensitive materials for opto-mechanical devices, photo-mechanical devices, and photoplate-making processes for patterned surfaces, can solve problems affecting function development and application, changing material phase structure, etc. Achieve the effects of low production cost, simple process, and easy promotion and application
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0043] Example 1
[0044]
[0045] 1. Preparation of the phase separation structure: dissolve the block polymer 1 obtained by polymerization in an organic solvent solution such as toluene or tetrahydrofuran to obtain a homogeneous clear solution, which is fully dissolved and filtered. The polymer film is formed on the clean substrate by spin coating or bar coating. After the polymer film is annealed, a regular and orderly nanophase separation structure can be obtained. The structure generally has a diameter of 5-30 nanometers and a period of 10-100 nanometers. The distribution structure generally has a strip shape or a dot shape. As the main object of rapid control, the strip shape is arranged alternately and parallel between different phases. The specific shape is as Figure 5 (a), Image 6 (a) Shown.
[0046] 2. Ultraviolet light response: Under certain conditions, such as room temperature, this kind of film can rapidly change the nano pattern when irradiated under ultraviolet ...
Example Embodiment
[0049] Example 2
[0050]
[0051] 1. Preparation of phase separation structure: Polymer 2 is used to prepare a polymer film, and the preparation method is the same as in Example 1.
[0052] 2. Ultraviolet light response: the same as in Example 1.
[0053] 3. The regulation of the nano pattern by ultraviolet light: the same as in Example 1.
[0054] 4. Regulation of large-area nanopatterns: the same as in Example 1.
Example Embodiment
[0055] Example 3
[0056]
[0057] 1. Preparation of phase separation structure: Polymer 3 is used to prepare a polymer film, and the preparation method is the same as in Example 1.
[0058] 2. Ultraviolet light response: the same as in Example 1.
[0059] 3. The regulation of the nano pattern by ultraviolet light: the same as in Example 1.
[0060] 4. Regulation of large-area nano-patterns: same as Example 1.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap