Conductive membrane as well as preparation method and application thereof
A technology of conductive thin films and electroluminescent devices, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., and can solve the problem of low work function of conductive thin films
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[0030] The preparation method of the above-mentioned conductive film 100 comprises the following steps:
[0031] S110. Put the Au target material, the MeO target material and the substrate into the vacuum chamber of the magnetron sputtering coating equipment, wherein the vacuum degree of the vacuum chamber is 1.0×10 -3 Pa~1.0×10 -5 Pa.
[0032] The substrate is a glass substrate. Preferably, the substrate is ultrasonically cleaned with acetone, absolute ethanol and deionized water before use.
[0033] In this embodiment, the vacuum degree of the vacuum chamber is preferably 5×10 -4 Pa.
[0034] Step S120, sputtering the Au layer 10 on the surface of the substrate, the process parameters of sputtering the Au layer 10 are as follows: the base-target distance is 45mm-95mm, the energy of the laser is 80W-300W, the pressure is 3Pa-30Pa, and an inert gas is introduced, The flow rate of the inert gas is 10sccm-40sccm, and the substrate temperature is 250°C-750°C.
[0035] Prefe...
Embodiment 1
[0063] Metal gold powder and CaO powder with a purity of 99.9% are selected and put into two porcelain boats respectively, and then the porcelain boats are loaded into a vacuum cavity. Then, the glass substrate was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, and placed in a vacuum chamber. The distance between the target and the substrate is set to 60mm. Use a mechanical pump and a molecular pump to pump the vacuum of the cavity to 5.0×10 -4 Pa, the working gas flow rate of argon is 20sccm, the pressure is adjusted to 10Pa, the substrate temperature is 500°C, and the laser energy is 150W. The Au target material and the MeO target material were sputtered successively, and thin films of 12nm and 2nm were deposited respectively to obtain a transparent conductive thin film of Au-CaO double layer.
[0064] Test results: The square resistance measured by a four-probe resistance tester is 10Ω / □, and the surface work function measured by a...
Embodiment 2
[0068] Metal gold powder and CaO powder with a purity of 99.9% are selected and put into two porcelain boats respectively, and then the porcelain boats are loaded into a vacuum cavity. Then, the glass substrate was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, and placed in a vacuum chamber. The distance between the target and the substrate was set to 45mm. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -5 Pa, the working gas flow rate of argon is 10 sccm, the pressure is adjusted to 3Pa, the substrate temperature is 250°C, and the laser energy is 300W. The Au target material and the MeO target material are sputtered successively, and thin films of 20nm and 0.5nm are respectively deposited to obtain an Au-CaO multilayer transparent conductive film.
[0069] Test results: The square resistance measured by a four-probe resistance tester is 15Ω / □, and the surface work function measured by a su...
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