Method for culturing high temperature-resistant osmunda japonica seedlings
A cultivation method and high temperature-resistant technology, applied in the directions of botanical equipment and methods, cultivation, culture medium, etc., can solve the problems of restricting the cultivation and popularization of Mikaria, low spore germination rate, and difficulty in normal growth, and reduce the incidence of diseases and insect pests. , Improve germination rate, loose texture and breathable effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0042] A method for cultivating high temperature-resistant vetch seedlings, comprising the steps of:
[0043] (1) Spore collection:
[0044] In the middle of May every year, when 70% of the spore leaves of Osmanthus vetch are unfolded and the lower part starts to turn yellow, they are picked and placed on newspapers in a ventilated place indoors to allow them to mature and dry naturally. After 3 days, the spores are scattered on the paper. After the sundries are removed through the sieve, the spores are collected for later use;
[0045] (2) Spore pretreatment:
[0046] a. Put the spores collected in step (1) into distilled water, wash them thoroughly, put them at 23°C for 17 minutes, and take them out for later use;
[0047] b. Simultaneously apply blue light and ultrasonic treatment to the spores treated in operation a, the wavelength of the blue light is 458nm, and the light intensity is 160 μmol·m -2 ·s -1 , the frequency of the ultrasonic wave is 34KHz, and it is tak...
PUM
Property | Measurement | Unit |
---|---|---|
Wavelength | aaaaa | aaaaa |
Wavelength | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com