Polarization sensitive photoelectric detector
A photodetector and polarization-sensitive technology, applied in photometry, circuits, electrical components, etc., using electric radiation detectors, can solve the problem of little polarization information detection, and achieve miniaturization and integration, enhanced light Effect of absorption and improvement of photoelectric responsivity
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Embodiment 1
[0026] In order to realize a polarization-sensitive photodetector suitable for polarization detection in the visible region, quartz is selected as the substrate, and an aluminum film back-gate electrode is prepared on the surface by magnetron sputtering; the upper surface of the back-gate electrode is evaporated by electron beam Method to prepare SiO 2 Insulating spacer layer; on the surface of the insulating spacer layer, use magnetron sputtering to prepare a ZnO thin film active layer with a thickness of about 100nm; then use a thermal evaporation coating process to prepare a gold thin film drain and source on the surface of the active layer; Between the drain electrodes and on the semiconductor active layer, the periodic metal grating plasmonic structure is prepared by electron beam lithography and lift-off process.
[0027]The linearly polarized light in the visible light region is incident on the periodic metal grating, and after exciting the plasmon resonance, it decays ...
Embodiment 2
[0029] In order to realize a polarization-sensitive photodetector suitable for polarization detection in the near-infrared region, quartz is selected as the substrate, and the back-gate electrode of gold film is prepared by thermal evaporation coating process; the method of magnetron sputtering is used on the upper surface of the back-gate electrode Preparation of SiO 2 Insulating spacer layer; on the surface of the insulating spacer layer, the Si active layer is prepared by plasma-enhanced chemical vapor deposition; after that, the gold thin film drain and source are prepared on the surface of the active layer by thermal evaporation coating; between the source and the drain 1. On the semiconductor active layer, the periodic metal grating plasmonic structure is prepared by electron beam lithography and lift-off process.
[0030] The linearly polarized light in the near-infrared region is incident on the periodic metal grating plasmon structure, and the plasmon resonance is exc...
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