Method for preparing and recycling sulfone polymer quartz crystal chip
A quartz crystal and polymer technology is applied in the field of preparation and recycling of sulfone polymer quartz crystal chips to achieve the effects of reducing costs, realizing recycling and promoting interaction
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[0034] A method for preparing a sulfone polymer quartz crystal chip of the present invention comprises the following steps:
[0035] 1) Pre-treatment of quartz crystal substrate: Firstly, irradiate the quartz crystal substrate with the surface of silicon dioxide under a UV lamp with a power of 12W and a wavelength of 254nm for 10-15min, and then impregnate it in a concentration of 5-10% , Sodium lauryl sulfate solution at a temperature of 20-30°C for 20-30min, then ultrasonically in ultrapure water for 2-5min, after the ultrasonication is completed, fully rinse the quartz crystal substrate with ultrapure water, and finally dry it with nitrogen ,stand-by;
[0036] 2) Polymer solution preparation: mix sulfone polymer (polysulfone or polyethersulfone) with organic solvent (dimethylacetamide, dimethylformamide, dimethyl sulfoxide or N-methylpyrrolidone) according to the mass The percentage is 10-15%: the proportion of 85-90% is stirred and dissolved at 40-70°C for 4-10 hours, and...
Embodiment 1
[0045] 1) Preparation of polysulfone quartz crystal chip:
[0046] First, the silica quartz crystal substrate was irradiated for 15 minutes under a 12W ultraviolet lamp with a wavelength of 254nm, and then it was immersed in a sodium dodecyl sulfate solution with a mass concentration of 8% at 25°C for 25 minutes, and then placed in an ultra- Sonicate in pure water for 5 minutes, fully rinse the quartz crystal substrate with ultrapure water, and finally dry it with nitrogen gas for use.
[0047] Secondly, the polysulfone with a mass percentage of 12% and the N-methylpyrrolidone with a mass percentage of 88% were stirred and dissolved at 60° C. for 8 hours, and then stood at room temperature for 2 hours to obtain a homogeneous polysulfone solution for use.
[0048] Install the above-mentioned quartz crystal substrate on a centrifugal rotating equipment platform equipped with a heating plate. First, in a low-temperature environment of 5°C, drop 8 μL of polysulfone solution onto t...
Embodiment 2
[0053] 1) Preparation of polyethersulfone quartz crystal chip:
[0054] First, the silica quartz crystal substrate was irradiated for 10 minutes under a 12W ultraviolet lamp with a wavelength of 254nm, and then it was immersed in a sodium dodecyl sulfate solution with a mass concentration of 10% at 20°C for 30 minutes, and then placed in an ultra-violet lamp. Sonicate in pure water for 2 minutes, and finally rinse thoroughly with ultrapure water and blow dry with nitrogen, and set aside.
[0055] Next, the polyethersulfone with a mass percentage of 15% and the dimethylformamide with a mass percentage of 85% were stirred and dissolved at 70° C. for 4 hours, and then stood at room temperature for 4 hours to obtain a homogeneous polyethersulfone solution for use.
[0056] Install the above-mentioned quartz crystal substrate on a centrifugal rotating equipment platform equipped with a heating plate. First, in a low-temperature environment of 10°C, drop 7 μL of polyethersulfone sol...
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