Chemical plating solution for Ni-P plated layer and controllable preparation method of micro-nano mold

Abstract

The embodiment of the invention provides a chemical plating solution for a Ni-P plated layer. The chemical plating solution comprises a main salt NiSO4.6H2O of which the concentration is 27 g/L, a reductant NaH2PO2.H2O of which the concentration is 16-28 g/L, a complexant lactic acid, a complexant propionic acid, and a stabilizer thiourea of which the concentration is 1 mg/L, wherein the pH value of the chemical plating solution is adjusted to be 4.5-5. The embodiment of the invention further provides a controllable preparation method of a micro-nano mold. According to the controllable preparation method, the chemical plating solution is utilized, and the Ni-P plated layer is prepared by adopting an ultrasonic vibration-assisted chemical plating method, Through improvement of the composition of the chemical plating solution, the deposition velocity of the plated layer is greatly improved, the prepared plated layer is higher in uniformity, the distribution of cellular particles is denser, and the hardness and the corrosion resistance of the plated layer are obviously improved; under the premise that mold die needs not be relatively greatly adjusted, various kinds of high-quality micromorphology are efficiently obtained; and meanwhile, component-controllable preparation of the plated layer and reconfiguration control of a crystal structure can be achieved by changing chemical components of the chemical plating solution, a flexible machining system can be constructed, the machining cost can be reduced, and the machining efficiency and the machining quality can be improved.

Description

technical field [0001] The invention belongs to the technical field of optical element processing, and in particular relates to an electroless plating solution for preparing Ni-P (nickel-phosphorus alloy) coatings for processing micro-nano moulds. The invention also provides a method for controllably preparing a micro-nano mold using the electroless plating solution. Background technique [0002] Optical micro-nano array refers to the arrangement and combination of a certain number of micro-nano-scale lenses or prisms. Because of its special geometric characteristics, it has excellent imaging characteristics and diffraction performance that traditional optical elements do not have. It is an important optical element in modern optical engineering. device. Optical micro-nano arrays with different materials, unit shapes and period sizes have various optical properties, which can be used not only for their imaging properties, but also for their diffraction properties to achieve...

AI Technical Summary

Problems solved by technology

[0007] What the present invention aims to solve is the technical problems such as slow coating deposition rate, insufficient uniformity, hardness and corrosion resistance during the processing of the existing glass micro-nano array Ni-P coating mold, and the embodiment of the present invention provides Ni-P coating electroless p

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