Method for preparing gas-phase hydrogen chloride by utilizing chlorosilane residue

A chlorosilane residual liquid, hydrogen chloride technology, applied in chlorine/hydrogen chloride, preparation with chloride, chemical instruments and methods, etc., can solve the problems of difficult separation, waste of chlorosilane residual liquid resources, narrow use range, etc., and achieve high efficiency Collection and generation of simple and easy-to-use effects

Active Publication Date: 2017-05-10
KUNMING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, the treatment of chlorosilane raffinate in most domestic polysilicon factories is to mix the raffinate with nitrogen, then enter the absorption tower to be absorbed by lye, and finally obtain a mixed solution of sodium silicate and sodium chloride, which is difficult to separate and has low purity. The use range is narrow, resulting in waste of resources for chlorosilane residual liquid, and even chlorine pollution to the environment

Method used

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  • Method for preparing gas-phase hydrogen chloride by utilizing chlorosilane residue

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Embodiment 1

[0030] A method for producing gaseous hydrogen chloride by using chlorosilane raffinate described in this embodiment specifically comprises the following steps: Utilize industrial concentrated sulfuric acid to prepare 1000 g of 20% sulfuric acid and place it in stirring reactor 1, slowly add 3200 g of chlorosilane raffinate dropwise The mixed gas generated by the reaction enters the condenser 6, adjusts the temperature of the condenser at -15°C, condenses the liquid state and returns it to the stirred reactor 1 to continue hydrolysis, and the gas phase material enters the high-pressure separator 7 to adjust the separation The pressure of the device is 2.4Mpa. The vacuum acid-resistant bottle is used to collect the liquid material separated by the high-pressure separator, and the hydrogen gas storage is used to collect the separated hydrogen. After the collection is completed, the weight of the acid-resistant bottle is increased by 2501.3g. The calculation shows that the recovery...

Embodiment 2

[0033] A method for producing gas-phase hydrogen chloride by utilizing chlorosilane raffinate described in this embodiment specifically comprises the following steps: Utilize industrial concentrated sulfuric acid to prepare 1000 g of 40% sulfuric acid and place it in stirring reactor 1, slowly add 2000 g of chlorosilane raffinate dropwise The mixed gas generated by the reaction enters the condenser 6, adjusts the temperature of the condenser at -20°C, condenses the liquid state and returns it to the stirred reactor 1 to continue hydrolysis, and the gas phase material enters the high-pressure separator 7 to adjust the separation The pressure of the device is 2.0Mpa. Use the vacuum acid-resistant bottle to collect the liquid material separated by the high-pressure separator, and use the hydrogen storage to collect the separated hydrogen. After the collection, the weight of the acid-resistant bottle increases by 1572.4g. The calculation shows that the recovery rate of hydrogen chlo...

Embodiment 3

[0036] A method for producing gas-phase hydrogen chloride by utilizing chlorosilane raffinate described in this embodiment specifically comprises the following steps: Utilize industrial concentrated sulfuric acid to prepare 1000 g of 60% sulfuric acid and place it in stirring reactor 1, slowly add 880 g of chlorosilane raffinate dropwise The mixed gas generated by the reaction enters the condenser 6, adjusts the temperature of the condenser at -30°C, condenses the liquid state and returns it to the stirred reactor 1 to continue hydrolysis, and the gas phase material enters the high-pressure separator 7 to adjust the separation The pressure of the device is 2.2Mpa. Use a vacuum acid-resistant bottle to collect the liquid material separated by the high-pressure separator, and use a hydrogen storage to collect the separated hydrogen. After the collection, the weight of the acid-resistant bottle increases by 679.2g. The calculation shows that the recovery rate of hydrogen chloride i...

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Abstract

The invention discloses a method for preparing gas-phase hydrogen chloride by utilizing chlorosilane residue and belongs to the field of polycrystalline silicon residue treatment. The method comprises the following steps: performing hydrolysis reaction on the chlorosilane residue under a high-concentration sulfuric acid atmosphere, wherein hydrogen chloride gas is difficult to dissolve in liquid and can volatilize under the water absorption effect of the sulfuric acid; guiding the hydrogen chloride gas, the hydrogen generated from hydrolysis reaction and vaporized chlorosilane residue into a condenser and a high-pressure separator in turn; and treating and then separating, thereby acquiring a hydrogen chloride product. According to the invention, the production process is simple and reasonable, the resource utilization problem of the chlorosilane residue can be solved and the hydrogen chloride can be effectively recycled.

Description

technical field [0001] The invention discloses a method for obtaining hydrogen chloride in a gas phase by utilizing chlorosilane raffinate, and belongs to the field of polysilicon raffinate treatment. Background technique [0002] Sulfuric acid is one of the most active binary inorganic strong acids. High-concentration sulfuric acid has strong water absorption and can be used as a dehydrating agent in organic synthesis. [0003] The improved Siemens method is the mainstream technology for polysilicon production in China today. In the process of producing polysilicon by the improved Siemens method, there will be chlorosilane in the synthesis of trichlorosilane, rectification and purification of trichlorosilane, reduction of trichlorosilane and cold (hot) hydrogenation. A raffinate is produced. Main ingredients: polychlorosilane, SiCl 4 , SiHCl 3 、SiH 2 Cl 2 , HCl, a small amount of silicon powder and metal chlorides. At present, the treatment of chlorosilane raffinate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/03C01B3/06C01B33/14
CPCY02E60/36C01B7/035C01B3/06C01B33/14C01P2006/80
Inventor 黄兵董森林陈樑赵义李银光蔡吉祥徐卜刚高瑞红
Owner KUNMING UNIV OF SCI & TECH
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