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Zinc oxide-based ceramic sputtering target material and preparation method and application thereof

A zinc oxide-based, zinc oxide nanotechnology, applied in sputtering coating, metal material coating process, ion implantation coating and other directions, can solve the problem of uneven target composition, insufficient preparation of high-quality targets, and difficult to uniform composition And other issues

Active Publication Date: 2017-05-17
森祥(宁波)新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the main method of preparing zinc oxide-based sputtering targets is to mix the oxides of doped elements with zinc oxide powder mechanically, and then use hot pressing or cold isostatic pressing to obtain them at a high temperature above 1400°C. The method is relatively simple from the perspective of preparation technology, but it is particularly insufficient for the preparation of high-quality targets
Specifically, the existing preparation methods have the following deficiencies: (1) The sintering temperature is too high. Although the high sintering temperature is beneficial to obtain a high-density sputtering target, it is also easy to induce abnormal grain growth (grain size can vary more than 100μm); (2) the composition is difficult to be uniform, because the raw material is a powder mixed with oxides of doping elements and zinc oxide powder by ball milling, etc., and the amount of powder doped with oxides is small (usually zinc oxide 0.01% to 10% of the mass), it is difficult to ensure uniform mixing between the two by ball milling, resulting in uneven target composition, which in turn affects the uniformity of the photoelectric properties of the sputtered film; (3) The particle size of powder raw materials is mostly on the order of microns, and the sintering activity is low, so it is difficult to sinter densely at low temperature, and the higher sintering temperature will easily lead to the volatilization of oxygen in the zinc oxide target, which will affect the sputtering effect. film transmittance

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  • Zinc oxide-based ceramic sputtering target material and preparation method and application thereof
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preparation example Construction

[0101] The invention provides a method for preparing a zinc oxide-based target, the method comprising the following steps:

[0102] 1) providing a mixed slurry, the mixed slurry comprising zinc oxide nanopowder doped, pure zinc oxide nanopowder and optional dispersant solution;

[0103] 2) The mixed slurry is dried to form a powder and then pressed into shape to obtain a ceramic green body;

[0104] 3) Sintering the ceramic green body to obtain the zinc oxide-based target material.

[0105] In the present invention, the doped zinc oxide nanopowder has one or more characteristics selected from the following group:

[0106] 1) The doped zinc oxide nanopowder is a nanopowder doped with elements including (but not limited to) the following group: aluminum, gallium, indium, tin, chromium, vanadium, titanium, tungsten, zirconium, or a combination thereof;

[0107] 2) Based on the total weight of the doped zinc oxide nanopowder, the total doping concentration of doping elements in...

Embodiment 1

[0219] Embodiment 1 prepares the zinc oxide nano-powder body of high concentration doping

[0220] (1) 10g aluminum nitrate and 40g zinc nitrate are dissolved in 200ml deionized water to form a salt solution whose total concentration of salt is 1.06mol / L;

[0221] (2) 14.77g precipitant ammoniacal liquor is dissolved in deionized water and forms the precipitant solution of 2.12mol / L;

[0222] (3) Under strong stirring, evenly drop the salt solution prepared in step (1) into the precipitant solution prepared in step (2) at a speed of 10mL / min, and keep the pH value of the mixed system during the dropping process is 7.5, the temperature is 70°C, and the co-precipitated product is obtained;

[0223] (4) After aging the above coprecipitated product at 30° C. for 20 h, the precipitate was washed with deionized water and absolute ethanol in turn, and then dried to obtain a white product;

[0224] (5) The above-mentioned white product was calcined at 700°C for 4 hours to obtain hig...

Embodiment 2

[0225] Embodiment 2 prepares sintering starting material

[0226] (1) the high-concentration doped zinc oxide nano-powder prepared by weighing 10g embodiment 1 is mixed with the pure zinc oxide nano-powder of 300nm with a particle diameter of 90g;

[0227] (2) Pour the powder into 100ml deionized water containing 1wt% dispersant polyvinyl alcohol after mixing, and form a slurry through 12h ball milling (ball milling speed is 250 rpm);

[0228] (3) The slurry was taken out and placed in an oven at 80° C. to dry for 20 hours, and then ground to form a powder, which was used as a starting material for ceramic sintering.

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Abstract

The invention relates to a zinc oxide-based ceramic sputtering target material and a preparation method and application thereof and particularly discloses a preparation method of the zinc oxide-based target material. According to the preparation method, high-concentration doped zinc oxide nano powder and pure zinc oxide nano powder serve as raw materials, and doping elements with extremely low content can be evenly distributed in the obtained target material; and in addition, the raw materials are on the nanoscale, and accordingly the zinc oxide-based target material which is small in grain size and high in compactness can be obtained through sintering at a low sintering temperature. The invention further discloses the zinc oxide-based target material and application thereof. The preparation method has the characteristics of being simple in technique, low in cost, safe, environmentally friendly and capable of being popularized on a large scale.

Description

technical field [0001] The invention relates to the field of optoelectronic materials, in particular to a zinc oxide-based ceramic sputtering target and its preparation method and application. Background technique [0002] Zinc oxide, as an environmentally friendly and abundant multifunctional wide-bandgap oxide material, can become a material with high photoelectric performance after a certain amount of degenerate doping (such as aluminum, gallium, indium, tin, etc.). Transparent conductive oxide material (transparent conductive oxide, TCO) has the advantages of ultraviolet light absorption, visible light transparency, infrared light reflection and adjustable electrical properties. It can be used as the transparent electrode layer, intermediate dielectric layer and high reflection layer of the back electrode in thin-film solar cells, the functional dielectric layer in energy-saving Low-E glass, and the transparent electrode layer of smart glass. And the infrared reflective...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/086C23C14/3414C23C14/35
Inventor 杨晔兰品军宋伟杰温艳玲朱永明
Owner 森祥(宁波)新材料有限公司