Photosensitive imaging composition containing cyclohexane amide monofunctional acrylate copolymer
A cyclohexaneamide monofunctional, imaging composition technology, applied in the direction of photosensitive materials used in optomechanical equipment, etc., can solve the problems of reducing the printing durability of the plate, insufficient dot protection, reducing the sensitivity of the plate, etc. The effect of alcohol resistance and printing endurance, inhibition of lateral dissolution rate, and improvement of the dot quality of the plate
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Embodiment 1
[0036] Preparation of lithographic plates
[0037] (1) Preparation of the aluminum plate base: an aluminum plate with a thickness of 0.28mm is subjected to degreasing treatment in 7wt% sodium hydroxide aqueous solution for 40 seconds at a temperature of 55°C. , in the hydrochloric acid aqueous solution that concentration is 10wt%, carry out electrolytic treatment with sine wave alternating current, 50HZ alternating current, electric current 50A / dm 2 , the electrolysis time is 60 seconds, control Ra=0.3-0.6um, preferably 0.4-0.6um, Rz (H) The value is 2 to 3 μm, then at 60°C, remove slag in 50wt% sodium hydroxide aqueous solution for 10 seconds, and then at 25°C with a current density of 5A / d㎡ and a concentration of 20wt% sulfuric acid Treat in solution for 40 seconds, control oxide film = 2.5-3.5g / m 2 . Finally, at 60 °C with NaH 2 PO 4 -NaF solution is sealed for 30 seconds to obtain an aluminum base suitable for a lithographic printing plate.
[0038] (2) The photosens...
Embodiment 2
[0051] The sample preparation method is the same as in Example 1, and the content of each component in the photosensitive imaging composition is as shown in Table 4:
[0052] Table four
[0053] BTB-225 resin (Weihai Tiancheng Chemical Co., Ltd.) 0.193g PD-1646 resin (HEXION, USA) 0.579g Cyclohexaneamide monofunctional acrylate copolymer (m:n=5:1) 0.15g Infrared absorbing dye LC-01 (Honywell company) 0.02g Alkylbenzenesulfonic acid 0.04g methyl violet 0.018g
[0054] The above-mentioned photosensitive lithographic plate is installed on the plate-making machine for exposure. Use alkaline developer TPD-83 (manufactured by Lucky Huaguang Printing Technology Co., Ltd.) to develop at 25°C for 25 seconds. The sensitivity and development latitude are shown in Table 14.
Embodiment 3
[0056] The sample preparation method is the same as in Example 1, and the content of each component in the photosensitive imaging composition is as shown in Table 5:
[0057] Table five
[0058] BTB-225 resin (Weihai Tiancheng Chemical Co., Ltd.) 0.437g PD-1646 resin (HEXION, USA) 0.28 Cyclohexaneamide monofunctional acrylate copolymer (m:n=5:1) 0.20g Infrared absorbing dye LC-01 (Honywell company) 0.02g
[0059] 3,4,5-Trimethoxybenzoic acid 0.04g Ethyl Violet 0.02g
[0060] The above-mentioned photosensitive lithographic plate is installed on the plate-making machine for exposure. Use alkaline developer TPD-83 (manufactured by Lucky Huaguang Printing Technology Co., Ltd.) to develop at 25°C for 30 seconds. The sensitivity and development latitude are shown in Table 14.
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