A preparation method of corrosion-resistant layer on the surface of copper-magnesium alloy based on double-cathode plasma sputtering deposition technology
A copper-magnesium alloy, corrosive environment technology, applied in the field of metal surface treatment
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Embodiment 1
[0022] In the first step, use Cu-Mg0.3wt% copper-magnesium alloy with graphite as the anode and copper-magnesium alloy as the cathode to obtain Ti-B alloy coating by electrodeposition in the electrolyte, and the current density range is 2.0A / dm 2 , the electrodeposition temperature is 45°C, and the deposition time is 200s; the electrolyte includes the following components: titanium tetrachloride 10 g / L, boron salt 3 g / L, boric acid 12 g / L, dodecylsulfuric acid Sodium 0.5g / L, through H 2 SO 4 Adjust the pH range of the electrolyte to 4; after the electrolysis is completed, take out the workpiece, wash it with ethanol and water in turn, and dry it;
[0023] In the second step, metal niobium is used as the target, and a dense layer of Nb is formed on the surface of the workpiece obtained in the first step by double-cathode plasma sputtering deposition method. The target voltage is 650 V, and the workpiece voltage is 140 V. The target and workpiece The spacing is 12 mm, the Ar p...
Embodiment 2
[0025] In the first step, use Cu-Mg0.3wt% copper-magnesium alloy with graphite as the anode and copper-magnesium alloy as the cathode to obtain Ti-B alloy coating by electrodeposition in the electrolyte, and the current density range is 8.0A / dm 2 , the electrodeposition temperature is 65°C, and the deposition time is 600s; the electrolyte includes the following components: titanium tetrachloride 30 g / L, boron salt 5 g / L, boric acid 20 g / L, dodecyl Sodium sulfate 0.8g / L, through H 2 SO 4 Adjust the pH range of the electrolyte to 6; after the electrolysis is completed, take out the workpiece, wash it with ethanol and water in turn, and dry it;
[0026] In the second step, metal niobium is used as the target, and a dense layer of Nb is formed on the surface of the workpiece obtained in the first step by double-cathode plasma sputtering deposition method. The target voltage is 750 V, and the workpiece voltage is 260 V. The target and The workpiece spacing is 18 mm, the Ar pressu...
Embodiment 3
[0028] Step 1: Use Cu-Mg0.3wt% copper-magnesium alloy with graphite as anode and copper-magnesium alloy as cathode to obtain Ti-B alloy coating by electrodeposition in the electrolyte with a current density range of 4.0A / dm 2 , the electrodeposition temperature is 55°C, and the deposition time is 500s; the electrolyte includes the following components: titanium tetrachloride 15 g / L, boron salt 4 g / L, boric acid 16 g / L, dodecylsulfuric acid Sodium 0.6g / L, through H 2 SO 4 Adjust the pH range of the electrolyte to 5; after the electrolysis is completed, take out the workpiece, wash it with ethanol and water in turn, and dry it;
[0029] In the second step, metal niobium is used as the target, and a dense layer of Nb is formed on the surface of the workpiece obtained in the first step by double-cathode plasma sputtering deposition method. The target voltage is 690 V, and the workpiece voltage is 210 V. The target and The distance between the workpieces is 16 mm, the Ar pressure...
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