A Method for Fabricating Ultrafast Response Gan Photoconductive Switch Using Proton Irradiation
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- XIDIAN UNIV
- Publication Date
- 2019-02-19
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Abstract
Description
technical field
[0001] The invention belongs to the field of ultrafast photoelectric detection, and relates to a photoconductive GaN semiconductor photoconductive switch (PCSS). Background technique
[0002] Wide bandgap semiconductor materials such as GaN, SiC and diamond have excellent high-voltage resistance characteristics, especially GaN photoconductive switches are very suitable for high-voltage, high-power photoelectric conversion systems. More importantly, GaN as a direct band gap not only has a sub-picosecond response speed comparable to GaAs, but also has a high electron saturation rate (2.5×10 7 cm / s), high thermal conductivity (1.3W / cm K), and has a higher breakdown field strength (3.5x10 6 V / cm) and good linear working mode, it has very important research value and application prospect in the preparation of high reliability, fast response, high power solid-state photoelectric switch.
[0003] The key performance requirements for photoconductive switches are: h...