Preparation method for organic silicon nanometer hard protective coating

A protective coating and nano-coating technology, which is applied in coatings, metal material coating processes, gaseous chemical plating, etc., can solve problems such as poor controllability of coating thickness, adverse effects of electronic products, and difficulty in controlling nano-levels , to achieve the effect of improving protection performance, improving compactness and speed
CN107523809AActive Publication Date: 2017-12-29JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
JIANGSU FAVORED NANOTECHNOLOGY CO LTD
Publication Date
2017-12-29

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Abstract

The invention discloses a preparation method for an organic silicon nanometer hard protective coating, and belongs to the technical field of plasmas. In the method, a reaction chamber is vacuumized, an inert gas is charged to enable a base material to move, monomer steam is charged, chemical vapor deposition is carried out, and an organic silicon nanometer coating is prepared on the surface of the base material through the chemical vapor deposition; and the component of the monomer steam is the mixture of at least one organic silicon monomer containing double bonds and a Si-Cl structure or a Si-O-C structure or a Si-N-Si structure or a Si-O-Si structure or a cyclic structure, and at least one polyfunctional unsaturated hydrocarbon and hydrocarbon derivative, charging for the monomer steam is stopped, oxygen and / or vapor is charged, and hard treatment is carried out on the surface of the organic silicon nanometer coating. According to the preparation method disclosed by the invention, the traditional organic carbonate hydroxide compound monomer is replaced by the organic silicon monomer, each silicon atom at least provides 1-4 active sites, high activity is achieved, a part of oxygen is introduced into the monomer, organic silicon can be oxidized into nanometer silicon dioxide, and the hardness of the coating can be greatly increased due to a dispersion strengthening effect.
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Description

technical field

[0001] The invention belongs to the technical field of plasma chemical vapor deposition, and in particular relates to a preparation method of an organosilicon nano protective coating. Background technique

[0002] Anti-mold, anti-humidity, and anti-salt mist (referred to as three antis) are important problems that need to be solved during the storage, transportation and use of electronic devices. Mold, salt spray and humidity often cause electronic devices to fail due to short circuits. Therefore, coating protective coatings on the surface of electronic products is an important method to improve the service life of electronic products. As the types of electronic products continue to increase, more and more electronic devices need to be touched and operated, so that the protective coating is damaged by external force, resulting in a decrease in the protective performance of the coating. Therefore, for the protective coating used in the electronics industry, ...

Claims

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