Nano-imprint template as well as making method and application thereof

Abstract

The invention discloses a nano-imprint template. The nano-imprint template comprises a template main body, a plurality of photoresist microstructures and a fluorine rubber polymer layer, wherein the plurality of photoresist microstructures are arranged on the template main body; the fluorine rubber polymer layer coats outer layers with the photoresist microstructures; a bonding effect exists between the fluorine rubber polymer layer and the template main body, so that the fluorine rubber polymer layer is fixedly connected to the surface of the template main body. The nano-imprint template disclosed by the invention can play a role in protecting the photoresist microstructures in order to prevent the nano-imprint template from being deformed during use, so that the process quality of nano-imprint is enhanced; moreover, the oil resistance and corrosion resistance of the imprinting surface of the nano-imprint template can be improved, the surface has lower surface energy, and the problemof degumming can be effectively improved in an imprinting process. The invention also discloses a making method of the nano-imprint template and application of the nano-imprint template to making of amicro-structure substrate. Through the application method, the microstructure dimension and shape of a formed microstructure substrate can be ensured.

Description

technical field [0001] The invention belongs to the technical field of nano-imprinting, and specifically relates to a nano-imprinting template, a manufacturing method thereof, and a method for using the nano-imprinting template to manufacture a microstructure substrate. Background technique [0002] Due to economic reasons, the semiconductor industry is developing in the direction of continuously reducing the feature size, and the subsequent technological progress has led to an exponential increase in the cost of equipment; There is growing interest in low-cost pattern transfer techniques. By avoiding the use of expensive light sources and projection optics, nanoimprinting offers a substantial cost reduction over traditional photolithography methods. [0003] Due to the omission of the cost of optical lithography masks and the use of optical imaging equipment, NIL technology has the economic advantages of low cost and high output; in addition, NIL technology can be applied ...

AI Technical Summary

Problems solved by technology

[0004] The wide application of NIL technology in the display field is mainly reflected in the fact that it can achieve better optical performance such as light filtering, anti-reflection, and anti-reflection; however, NIL technology is mostly limited by its manufacturing process, including the production of master molds and soft films. Embossing process and etching process, etc. In the imprinting process, there is often a certain interaction between the material of the mold and the material of the imprinted substrate, resulting in the residue of the material on the substrate or the deformation of the microstructure during the demoulding process, thus also Bring more troubles to subsequent etching

At present, there is no good solution to the problems generated in the imprinting process, which has become one of the bottlenecks hindering the development of NIL technology.

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