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Preparation method and application of a nano-gap controllable silicon-based array

A nano-gap and array technology, applied in the field of nano-gap array materials, can solve the problems of complex preparation methods, small construction area, and poor uniformity, and achieve the effect of simple process, large construction area, and good uniformity

Active Publication Date: 2020-12-01
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Utilizing the surface-enhanced Raman effect is expected to realize the rapid trace detection of the concentration of sodium saccharin, but the substrate materials that produce the surface-enhanced Raman effect in the prior art are mainly noble metal nanoparticles such as gold and silver. These noble metal nanoparticles not only The structure area is small, the repeatability is poor, the uniformity is poor, and the preparation method is complicated and the cost is high, so the application of the surface-enhanced Raman effect is largely limited

Method used

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  • Preparation method and application of a nano-gap controllable silicon-based array
  • Preparation method and application of a nano-gap controllable silicon-based array
  • Preparation method and application of a nano-gap controllable silicon-based array

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preparation example Construction

[0029] Such as Figure 4 As shown, a method for preparing a nano-gap controllable silicon-based array comprises the following steps:

[0030] Step A, preparing closely arranged single-layer polystyrene colloidal crystal arrays on the silicon substrate, thereby obtaining a single-layer polystyrene colloidal crystal array on the silicon substrate.

[0031] Step B, using reactive ion etching to etch the single-layer polystyrene colloidal crystal array on the silicon wafer base, and removing the single-layer polystyrene colloidal crystal array on the silicon wafer base after the etching is completed, to obtain Tapered silicon-based arrays.

[0032] Step C, using the conical silicon-based array as a template, depositing a layer of gold film with a thickness of 10-50 nm on the surface of the template by physical deposition, and depositing gold nanospheres on the top of the conical silicon-based array, by Controlling the deposition time adjusts the distance between the gold nanosph...

Embodiment approach

[0034] (1) The preparation of a tightly arranged single-layer polystyrene colloidal crystal array on a silicon substrate comprises the following steps:

[0035] Step A1, put the silicon wafer base into acetone, ethanol, the first mixed solution, and deionized water in sequence for ultrasonic cleaning, then dry the cleaned silicon wafer base, and then place it in an ultraviolet ozone cleaner for 10 days of irradiation. ~40min to obtain a silicon substrate with a hydrophilic surface. Wherein, the first mixed solution is formed by mixing concentrated sulfuric acid with a mass concentration of 1.84 g / ml and hydrogen peroxide with a mass concentration of 1.1 g / ml according to a volume ratio of 3:1.

[0036] Step A2, put the silicon chip substrate with hydrophilic surface into polystyrene colloidal ball ethanol diluent, and use the air-liquid interface self-assembly method to prepare a tightly arranged single-layer polystyrene layer on the silicon chip substrate Colloidal Crystal Arr...

Embodiment 1

[0047] Such as Figure 4 As shown, a method for preparing a nano-gap controllable silicon-based array may specifically include the following steps:

[0048] Step a1, put the silicon chip substrate into acetone, ethanol, and the first mixed solution in turn (the first mixed solution is composed of concentrated sulfuric acid with a mass concentration of 1.84g / ml and hydrogen peroxide with a mass concentration of 1.1g / ml according to the volume ratio of 3 : 1 mixed), ultrasonically cleaned in deionized water, and then dried on the cleaned silicon substrate, and then placed in an ultraviolet ozone cleaning machine for 10-40 minutes of irradiation to obtain a silicon wafer with a hydrophilic surface base.

[0049] Step b1, take the polystyrene colloidal sphere suspension (2.5wt%) that the polystyrene colloidal sphere diameter is 120nm, and mix with ethanol equal volume, carry out 10~30min ultrasonic oscillation treatment again, thus make the homogeneously dispersed polystyrene Et...

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Abstract

The invention discloses a preparation method of a silicon substrate array with nanometer gaps being controllable and application thereof. The preparation method comprises the steps that a silicon slice substrate single-layer polystyrene colloidal crystal array is prepared; etching is conducted on the silicon slice substrate single-layer polystyrene colloidal crystal array by adopting a reactive ion etching method, the single-layer polystyrene colloidal crystal array is removed after etching is completed, and a tapered silicon substrate array is prepared; and the tapered silicon substrate arrayis taken as a template, a layer of gold film with the thickness being 10-50nm is deposited on the surface of the template by adopting a physical deposition method, gold nanoballs are deposited and formed at the top of the tapered silicon substrate, the distances among the gold nanoballs are adjusted by controlling the deposition time, and the silicon substrate array with the nanometer gaps beingcontrollable is prepared by controlling the deposition time and adjusting the distances among the gold nanoballs. The silicon substrate array is large in structure area, clean on surface, high in sensitivity and good in detection performance, can directly serve as a substrate material which has long-term stability and a high-activity surface enhanced Raman effect, and can be used for conducting rapid trace detection on the concentration of saccharin sodium salt. The preparation method is simple, convenient to operate, low in cost and economical and environmentally friendly.

Description

technical field [0001] The invention relates to the field of nano-gap array materials, in particular to a method for preparing a silicon-controlled silicon-based nano-gap (nanogap) array and its application. Background technique [0002] Sodium saccharin is a commonly used synthetic sweetener with the longest history and the most controversial in the food industry. It is widely used in beverages, jellies, preserves, pastries and other food industries. Sodium saccharin has no nutritional value to the human body except that it causes a sweet feeling in the sense of taste. When eating too much saccharin sodium, it will affect the normal secretion of gastrointestinal digestive enzymes, reduce the absorption capacity of the small intestine, and cause loss of appetite. At the same time, it will also cause thrombocytopenia, causing symptoms such as acute bleeding, multiple organ damage, and even malignant poisoning. Moreover, sodium saccharin also has certain carcinogenicity. Long...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/65B82Y30/00B82Y40/00C23C14/16C23C14/30C23C14/35
CPCB82Y30/00B82Y40/00C23C14/16C23C14/165C23C14/30C23C14/35G01N21/658
Inventor 杨绍松刘广强赵倩郭静蔡伟平
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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