A method for in situ formation of graphene and onion at friction interface to achieve super-slip
A technology of friction interface and graphene, which is applied in the direction of metal material coating process, coating, gaseous chemical plating, etc., can solve the problem of weak, high external dependence, lack of stability of key components and core technologies and high-end equipment and reliability issues to achieve the effect of reducing friction coefficient and wear rate and improving service life
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0019] Example 1 Preparation and deposition of fullerene-like carbon films on silicon wafers
[0020] (1) Routine cleaning;
[0021] (2) When the vacuum in the chamber reaches 1×10 -4 Start coating at 5 Pa, argon gas is controlled at 5 Pa, bias voltage is 800 V, conduction ratio is 0.8, frequency is 50 KHz, and cleaning is 30 minutes;
[0022] (3) The pulse bias voltage is set to -1000V, the conduction ratio is 0.4, the frequency is 70 Hz; the methane is 17Pa; the film is deposited for 120 minutes and then shut down to cool down;
[0023] (4) Take out the test after the sample is cooled to room temperature. The test result shows that the film has a hardness of 30GPa, a thickness of 1.5 microns, a surface finish of 0.1 nm, and the color of the film is black.
[0024] (5) as figure 1 As shown, the typical Raman spectrum of fullerene-like carbon films includes a steamed bread peak (peak at 1527 cm -1 ) and an acromion (about 1200cm -1 ).
Embodiment 2
[0025] Example 2 Preparation of in-situ nitriding and deposition of graphitic carbon films on GCr15 spheres
[0026] The specific implementation is as follows:
[0027] (1) Conventional cleaning: degreasing, rust removal, drying and placing in a vacuum chamber;
[0028] (2) When the vacuum in the chamber reaches 1×10 -4 Start coating at 5 Pa, argon gas is controlled at 5 Pa, bias voltage is 900 V, conduction ratio is 0.8, frequency is 50 KHz, and cleaning is 30 minutes;
[0029] (3) The pulse bias is set to -800V, the conduction ratio is 0.6, the frequency is 80 Hz; nitrogen is 8Pa; nitriding is 30 minutes;
[0030] (4) The pulse bias is set to -850V, the conduction ratio is 0.5, the frequency is 50Hz; the methane is 15Pa; and it is heated to 230°C, and the film is deposited for 120 minutes and then shut down to cool down;
[0031] (5) Take out the test after the sample is cooled to room temperature. The test result shows that the hardness of the film is 27GPa, the thicknes...
Embodiment 3
[0034] The two thin films form a friction pair, forming an onion at the friction interface ( figure 2 ) and graphene ( image 3 ). The friction coefficient is adjustable at 0.005±0.002 under different load conditions ( Figure 4 ). The friction reduction mechanism can be understood as the graphene and onion formed on the friction interface can effectively reduce the contact area of the friction pair or reduce the friction interface force through spherical contact or non-commensurate surface contact, such as Figure 5 shown.
PUM
| Property | Measurement | Unit |
|---|---|---|
| hardness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| surface smoothness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More