Ultra-short-channel metal-semiconductor-metal type photodetector and manufacturing method thereof
A photodetector and manufacturing method technology, applied in the field of optoelectronic information, can solve the problems of small photodark current, high contact barrier between metal and two-dimensional molybdenum disulfide, and low photoresponsivity
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[0024] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings.
[0025] An embodiment of the present invention provides an ultra-short channel metal-semiconductor-metal photodetector. For details, please refer to figure 1 , figure 1 A schematic diagram of the detector structure. Such as figure 1 As shown, an ultrashort channel metal-semiconductor-metal photodetector of the present invention is built on an insulating substrate 1 . The insulating substrate 1 is one of flexible transparent polyethylene terephthalate plastic film, transparent sapphire substrate and silicon wafer with oxide layer.
[0026] The bottom electrode 2 is constructed on the insulating substrate 1 by using ultraviolet lithography technology. Specifically, a layer of polymethyl methacrylate (PMMA) is spin-coated on the insulating substrate 1, and the pattern of the bottom electrode 2 is exposed by a...
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