Method for preparing high-density Ag nano-pillar surface enhanced Raman scattering substrate
A high-density, nano-column technology, applied in Raman scattering, nanotechnology, sputter plating, etc., can solve the problems of small number of SERS signal enhancements, complex preparation process, and inability to achieve SERS effects, etc., to achieve rich columnar structure distribution , The effect of mature and stable technology
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Embodiment 1
[0044] First vacuum the vacuum evaporation coating equipment to 10 -4 Pa, by controlling the electron beam current to pre-melt cylindrical silver particles with a purity of 99.99% to obtain the silver block required for evaporation. Subsequently, the polished single-crystal silicon substrate was ultrasonically cleaned in deionized water, absolute ethanol, and acetone solution for 15 minutes, and after completion, it was dried with a clean non-woven cloth and fixed on the fixture with the coated surface facing down. Vacuum up to 10 -4 Below Pa, after reaching the vacuum degree, use the electron gun to melt the pre-melted silver block in the graphite crucible to the molten state, open the baffle, control the current to stabilize at 100mA, the rate is 0.2nm / s, and the thickness of the plating is 25nm , making the desired silver metal film.
[0045] Place the coated substrate flat in the rapid annealing furnace, pass high-purity N 2 To exhaust the air in the furnace, set the he...
Embodiment 2
[0048] First vacuum the vacuum evaporation coating equipment to 10 -4 Pa, by controlling the electron beam current to pre-melt cylindrical silver particles with a purity of 99.99% to obtain the silver block required for evaporation. Subsequently, the polished single-crystal silicon substrate was ultrasonically cleaned in deionized water, absolute ethanol, and acetone solution for 15 minutes, and after completion, it was dried with a clean non-woven cloth and fixed on the fixture with the coated surface facing down. Vacuum up to 10 -4 Below Pa, after reaching the vacuum degree, use the electron gun to melt the pre-melted silver block in the graphite crucible to the molten state, open the baffle, control the current to stabilize at 150mA, the rate is 0.4nm / s, and the thickness of the plating is 5nm , making the desired silver metal film.
[0049] Place the coated substrate flat in the rapid annealing furnace, pass high-purity N 2 To exhaust the air in the furnace, set the hea...
Embodiment 3
[0052] First vacuum the vacuum evaporation coating equipment to 10 -4 Pa, by controlling the electron beam current to pre-melt cylindrical silver particles with a purity of 99.99% to obtain the silver block required for evaporation. Subsequently, the conductive glass substrate was ultrasonically cleaned in deionized water, absolute ethanol, and acetone solution for 15 minutes. After completion, dry the coated film with a clean non-woven cloth and fix it on the fixture. to 10 -4 Below Pa, after reaching the vacuum degree, use the electron gun to melt the pre-melted silver block in the graphite crucible to the molten state, open the baffle, control the current to stabilize at 100mA, the rate is 0.2nm / s, and the thickness of the plating is 25nm , making the desired silver metal film.
[0053] Place the coated substrate flat in the rapid annealing furnace, pass high-purity N2 To exhaust the air in the furnace, set the heating rate to 50°C / s, keep the temperature at 300°C for 1 m...
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