Preparation method of graphene thin film
A graphene film, graphene technology, applied in the direction of graphene, nano-carbon, etc., can solve the problem of small size of graphene oxide and graphene powder, inability to further prepare graphene assembly, and high requirements for graphene size uniformity, etc. problems, to achieve the effect of reducing severe shrinkage and agglomeration, facilitating collection and avoiding damage
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Embodiment 1
[0025] The preparation method of the present embodiment comprises the following steps:
[0026] Step 1, adding 0.1g graphene oxide to 1000mL mixed solvent, then stirring and dissolving under the condition of ultrasonic vibration to obtain a precursor solution; the concentration of graphene oxide in the precursor solution is 0.1mg / mL; the mixed solvent It is made by mixing 167mL water and 833mL ethanol;
[0027] Step 2, add 0.5g zinc flakes to the precursor solution obtained in step 1, then stir under the condition of ultraviolet light irradiation to carry out the reduction reaction, then stratify after standing, the upper layer solution obtained is a weakly reduced graphene colloid ;
[0028] Step 3, the weakly reduced graphene colloid that obtains in step 2 is coated on glass by spin coating method, obtains the weakly reduced graphene thin film that is attached to glass surface; The spin coating speed that described spin coating method adopts is 500 revolutions / minutes, th...
Embodiment 2
[0033] The preparation method of the present embodiment comprises the following steps:
[0034] Step 1, 1g graphene oxide is added in 1000mL mixed solvent, then stir and dissolve under the condition of ultrasonic vibration, obtain precursor solution; The concentration of graphene oxide in the described precursor solution is 1mg / mL; Described mixed solvent is made up of 375mL Water mixed with 625mL ethanol;
[0035] Step 2, adding 5g Ti6Al4V sheets to the precursor solution obtained in step 1, then stirring and carrying out the reduction reaction under the condition of ultraviolet light irradiation, and then stratifying after standing, the upper layer solution obtained is a weakly reduced graphene colloid;
[0036] Step 3, the weakly reduced graphene colloid obtained in step 2 is coated on the Si sheet by the spin coating method to obtain a weakly reduced graphene film attached to the surface of the Si sheet; the spin coating speed adopted by the spin coating method is 1500 rev...
Embodiment 3
[0040] The preparation method of the present embodiment comprises the following steps:
[0041] Step 1, 2g graphene oxide is added in 1000mL mixed solvent, then stir and dissolve under the condition of ultrasonic vibration, obtain precursor solution; The concentration of graphene oxide in the described precursor solution is 2mg / mL; Described mixed solvent is made of 500mL Water mixed with 500mL methanol;
[0042] Step 2: Add 10g of spherical particle Cu to the precursor solution obtained in step 1, then stir and carry out the reduction reaction under the condition of ultraviolet light irradiation, and then stratify after standing, the upper layer solution obtained is a weakly reduced graphene colloid ;
[0043] Step 3, the weakly reduced graphene colloid obtained in step 2 is coated on the microporous membrane by vacuum filtration method, and the weakly reduced graphene film attached to the bottom surface of the microporous membrane is obtained;
[0044] Step 4, place the we...
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