Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

59results about How to "Conducive to follow-up process" patented technology

Mixed weaving process

InactiveCN102367619AAvoid breakingReduce the number of stoppersLoomsWoven fabricsEngineeringMaximum pressure
The invention discloses a mixed weaving process. In the mixed weaving process, before artificial silk and dacron filaments are used for mixed weaving, firstly, the maximum tensioning limit of the artificial silk, i.e. the maximum pressure value capable of being exerted on the artificial silk is measured, and the tensioning resistance of the artificial silk is weaker than that of the dacron filaments, so the maximum pressure value capable of being exerted onto the artificial silk is adopted for mixed weaving, the tension of the artificial silk and the tension of the dacron filaments can be ensured to be both in the bearable range, and both the artificial silk and the dacron filaments can not easily fracture; and further, before the mixed weaving, the dacron filaments are pretreated so that the characteristics of the artificial silk more conform to the characteristics of the dacron filaments, and the proceeding of the subsequent process can be more favorably realized. In addition, in the process, when a waterjet loom is used for tracking the dacron filaments, a spray nozzle with the specification being 75 to 40 is adopted, a spray nozzle with the specification being 45 to 20 is adopted during the traction of the artificial silk, different characteristics of the artificial silk and the dacron filaments are considered, and the number of blocking elements required by the weaving of one hundred meters of plus materials can be obviously reduced.
Owner:SUZHOU DONGMAO TEXTILE IND

Polycrystalline silicon film morphology forming method

ActiveCN103943486AReduce or eliminate narrow edge casesLongitudinal width is uniformSemiconductor/solid-state device manufacturingSemiconductor devicesEtchingFlow ratio
The invention discloses a polycrystalline silicon film morphology forming method and belongs to the technical field of semiconductors. The polycrystalline silicon film morphology forming method comprises the steps of forming a grid electrode oxidation layer on a substrate and forming a polycrystalline silicon film layer on the grid electrode oxidation layer; performing doping treatment on the polycrystalline silicon film layer on the grid electrode oxidation layer; performing etching treatment on the polycrystalline silicon film layer subjected to the doping treatment according to the doping concentration distribution of the polycrystalline silicon film layer subjected to the doping treatment so as to form even polycrystalline silicon film morphology. In the polycrystalline silicon film morphology forming method, the transverse etching degree is influenced by adjusting the etching gas flow ratio or step-by-step etching according to the doping concentration distribution of the polycrystalline silicon film layer subjected to the doping treatment, accordingly the polycrystalline strip narrow edge situation is relieved or eliminated, even polycrystalline strips identical in longitudinal width are obtained, and follow-up process implementation is facilitated.
Owner:SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT

Infrared detector with micro-bridge structure and manufacturing method thereof

The invention relates to an infrared detector with a micro-bridge structure, which belongs to the technical field of micro-electromechanics, and comprises a silicon substrate as a read-out circuit of the infrared detector; a metal reflecting layer deposited on the silicon substrate; a dielectric layer which is deposited in a groove of the metal reflecting layer and has the height being consistent with that of the metal reflecting layer; a sacrifice layer and a first release protection layer used as protection of release of the sacrifice layer which are deposited on the dielectric layer and the metal reflecting layer and form through holes by lithography and etching; a copper or tungsten pier which is deposited in the through hole of the sacrifice layer; a metal electrode deposited on the copper or tungsten pier and the first release protection layer; and a sensitive material detecting layer which is deposited on the metal electrode and the first release protection layer. A Cu-column micro-bridge structure is manufactured by using the damascene process, and a flat micro-bridge plane is manufactured by introducing the chemical mechanical polishing process (CMP), thereby being conductive to the follow-up process and improving the performances.
Owner:ZHEJIANG DALI TECH +1

Semiconductor structure and formation method thereof

The invention relates to a semiconductor structure and a formation method thereof. The formation method comprises the steps of providing a substrate, wherein the surface of the substrate is provided with a pseudo gate dielectric film, and the surface of the pseudo gate dielectric film is provided with a pseudo gate film; forming a mask layer at part of the surface of the pseudo gate film, carrying out a first etching process on the pseudo gate film by taking the mask layer as a mask so as to form a first trench in the pseudo gate film, wherein the side wall of the first trench is vertical with the surface of the substrate, carrying out a second etching process on the pseudo gate film at the bottom of the first trench until the surface of the pseudo dielectric film is exposed, forming a second trench at the bottom of the first trench, forming a pseudo gate layer adjacent to the left pseudo gate film between the first trench and the second trench, wherein the top of the second trench is less than the bottom of the second trench in size, and the angle between the side wall of the second trench and the bottom surface of the second trench is an acute angle, and carrying out a third etching process on the exposed pseudo gate dielectric film until the surface of the substrate is exposed so as to form a pseudo gate dielectric layer. The formed semiconductor structure is good in appearance and improved in performance.
Owner:SEMICON MFG INT (SHANGHAI) CORP

Polyester polyamide and cotton bamboo blending process

InactiveCN107287729ANot easy to breakReduce the number of stoppersSucessive textile treatmentsLoomsPolyamidePolyester
The invention relates to a polyester polyamide and cotton bamboo blending process. The process includes following steps: (1), selecting polyester polyamide blended yarn; (2), selecting cotton bamboo blended yarn; (3), measuring maximum stretching limit of the cotton bamboo blended yarn, namely maximum pressure value that can be applied to the cotton bamboo blended yarn; (4), putting the polyester polyamide blended yarn into a water steamer; (5), presetting the polyester polyamide blended yarn after being treated in the step (4); (6), adopting a hydraulic loom to blend the polyester polyamide blended yarn and the cotton bamboo blended yarn at the maximum pressure value in the step (3), wherein a nozzle of 75-40 in specification is adopted for traction of the polyester polyamide blended yarn, and a nozzle of 45-20 in specification is adopted for traction of the cotton bamboo blended yarn. The polyester polyamide and cotton bamboo blending process has the advantage that the defect that finally woven products are unsatisfactory in quality due to the fact that characteristics of the polyester polyamide blended yarn and the cotton bamboo blended yarn are different when the polyester polyamide blended yarn and the cotton bamboo blended yarn are adopted for blending can be overcome.
Owner:RUGAO XIAYUAN SCI & TECH ESTABLISH A BUSINESS SERVICES CO LTD

Healthcare sheep feed produced through corn straw-effective microorganisms (EM) fermentation

Healthcare sheep feed produced through corn straw-effective microorganisms (EM) fermentation is disclosed. The feed is prepared from 450-480 parts by weight of corn straw, 4-6 parts by weight of oxalic acid, 9-12 parts by weight of sodium carbonate, 6-8 parts by weight of calcium chloride, 56-58 parts by weight of pine nut meal, 43-46 parts by weight of cassia bark broken bits, 4-6 parts by weight of Chinese date powder, 72-74 parts by weight of mung bean, 45-47 parts by weight of peach seeds, 13-15 parts by weight of pepper fruit juice, 23-26 parts by weight of fish scale powder, 15-18 parts by weight of field horsetail powder, 12-16 parts by weight of plantain herb, 14-18 parts by weight of camellia japonica, 0.4-0.6 part by weight of effective microorganisms, 1-2 parts by weight of broken pine pollen powder, 7-8 parts by weight of common yam rhizome powder, 10-12 parts by weight of seabuckthorn fruit seed powder, 3-5 parts by weight of fish meat, 2-3 parts by weight of Chinese cinquefoil powder and 5-7 parts by weight of chlorella powder. The feed is capable of improving digestion functions of sheep, regulating intestinal microecology of sheep, expelling toxins in sheep bodies and promoting body health of the sheep. The feed is rich in a plurality of vitamins and amino acids, and is capable of accelerating the sheep growth speed, increasing the weight gain rate and increasing the feed utilization rate.
Owner:SHOUXIAN LINHUAI ANIMAL HUSBANDRY BREEDING CO LTD

Preparation method of graphene thin film

The invention discloses a preparation method of a graphene thin film. The preparation method comprises the following steps: 1, adding graphene oxide into a mixed solvent and dissolving to obtain a precursor solution; 2, adding metal into the precursor solution and carrying out photocatalytic weak reduction reaction; after standing, layering to obtain weakly-reduced graphene colloid; 3, coating a substrate with the weakly-reduced graphene colloid to obtain a weakly-reduced graphene thin film attached on the surface of the substrate; 4, reducing the weakly-reduced graphene thin film attached onthe surface of the substrate and drying to obtain the graphene thin film. According to the preparation method disclosed by the invention, graphite oxide is weakly photocatalytically reduced into weakly-reduced graphene and then the weakly-reduced graphene is reduced into the graphene thin film; part of oxygen-containing groups are also remained on the weakly-reduced graphene, so that the graphenethin film has a self-assembling capability and the orderliness of the weakly-reduced graphene colloid is ensured; the quality of the graphene thin film is improved, the shrinkage and agglomeration ofthe graphene thin film in a drying process are reduced, damages to the graphene thin film are avoided and a size range of the graphene thin film is expanded.
Owner:NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH

Oxygen separating system used for producing steel wooden door metal material

The invention discloses an oxygen separating system used for producing a steel wooden door metal material. The oxygen separating system comprises an outer furnace shell, an inner furnace shell and an electric heating layer, a baffle is arranged in the inner furnace shell and internally divides the inner furnace shell into a melting chamber and a refining chamber, a charging pipe is arranged on the outer furnace shell, a connecting pipe, a discharging pipe, a first air inlet pipe, a second air inlet pipe, a second exhausting pipe, a first exhausting pipe and a conveying pipe are arranged outside the outer furnace shell, and a conveying shaft is arranged in the conveying pipe, penetrates through the end face of the conveying pipe to the outer space and is connected with a driving device, and a spiral blade is arranged around the conveying shaft. The feeding mode is improved, a workpiece can be conveyed to the melting chamber while preheated, the refining chamber and a casting box are arranged, mixed gas is introduced into molten aluminum in the refining chamber to remove aluminum oxide and hydrogen in the molten aluminum, the quality of the molten aluminum is improved, and it is ensured that the molten aluminum does not make contact with air in the casting process; the working environment is improved as a tail gas purifying device is further arranged.
Owner:成都森邦世纪木业有限公司

Production system for steel wooden door metal raw material

The invention discloses a production system for a steel wooden door metal raw material. The production system comprises an outer furnace shell, an inner furnace shell and an electric heating layer; a baffle is arranged in the inner furnace shell and divides the internal part of the inner furnace shell into a melting chamber and a refining chamber, a feeding pipe is arranged on the upper portion of the outer furnace shell, the outer side of the outer furnace shell is provided with a connecting pipe, a discharging pipe, a first gas inlet pipe, a second gas inlet pipe, a second exhaust pipe and a first exhaust pipe, the connecting pipe is communicated with the melting chamber and the refining chamber, the discharging pipe is communicated with a casting box and the refining chamber, the first gas inlet pipe is communicated with an external space, the melting chamber and the refining chamber, the second gas inlet pipe is communicated with the external space and the refining chamber, and the first exhaust pipe is communicated with the external space and the melting chamber. According to the production system, the refining chamber and the casting box are arranged, the purpose of removing aluminum oxide and hydrogen in molten aluminum is achieved by introducing mixed gas into molten aluminum contained in the refining chamber, and the molten aluminum quality is improved; in addition, a tail gas purifying device is arranged, and therefore the working environment is improved; it is guaranteed that molten aluminum cannot make contact with air in the casting process through the casting box.
Owner:成都森邦世纪木业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products