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Preparation method of nanoimprint hard templates

A technology of nano-imprinting and hard template, applied in the direction of photo-engraving process of pattern surface, opto-mechanical equipment, originals for opto-mechanical processing, etc., can solve the problems of low efficiency, unrealistic, fragile and so on

Inactive Publication Date: 2010-08-18
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, at present, due to the low flexibility and fragility of porous anodized alumina, it is unrealistic to directly use it as a template for large-scale nanoimprint production. beam lithography, X-ray lithography, and focused ion beam lithography, so large-area production is inefficient and expensive

Method used

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  • Preparation method of nanoimprint hard templates
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  • Preparation method of nanoimprint hard templates

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Embodiment 1

[0031] 1. First, a two-step electrochemical anodization method is used to prepare a regular anodized aluminum AAO template with adjustable size, ie, pore diameter, pore spacing, and pore depth, in a 0.1-0.5mol / L oxalic acid solution. The anode voltage is 40-50V. The temperature is 0-15°C, the first oxidation time is 2 hours, and the second oxidation time is 3-5 minutes. 3 PO 4 Reaming is carried out in the middle, and the AAO template of the required size is obtained as figure 1 as shown in (a);

[0032] 2. Next, under a standard atmospheric pressure and normal temperature, vapor-deposit the AAO template in the vapor atmosphere of perfluorooctyl-trichlorosilane for 80 to 100 minutes, and then bake it at 100°C for 13 to 15 minutes. A dense layer of organic molecules is formed, and this thin film makes the surface of the template have a very low surface energy, about 12 dynes / cm. figure 1 (b) is a schematic diagram of evaporation, figure 1 (c) is a schematic diagram of a low...

Embodiment 2

[0039] 1. First, a two-step electrochemical anodization method is used to prepare a regular anodized aluminum AAO template with adjustable size, ie, pore diameter, pore spacing, and pore depth, in a 0.1-0.5mol / L oxalic acid solution. The anode voltage is 40-50V. The temperature is 0-15°C, the first oxidation time is 2 hours, and the second oxidation time is 3-5 minutes. 3 PO 4 Reaming is carried out in the middle, and the AAO template of the required size is obtained as figure 1 as shown in (a);

[0040] 2. Next, under a standard atmospheric pressure and normal temperature, vapor-deposit the AAO template in the vapor atmosphere of perfluorooctyl-trichlorosilane for 80 to 100 minutes, and then bake it at 100°C for 13 to 15 minutes. A dense layer of organic molecules is formed, and this thin film makes the surface of the template have a very low surface energy, about 12 dynes / cm. figure 1 (b) is a schematic diagram of evaporation, figure 1 (c) is a schematic diagram of a low...

Embodiment 3

[0047] 1. First, a two-step electrochemical anodization method is used to prepare a regular anodized aluminum AAO template with adjustable size, ie, pore diameter, pore spacing, and pore depth, in a 0.1-0.5mol / L oxalic acid solution. The anode voltage is 40-50V. The temperature is 0-15°C, the first oxidation time is 2 hours, and the second oxidation time is 3-5 minutes. 3 PO 4 Reaming is carried out in the middle, and the AAO template of the required size is obtained as figure 1 as shown in (a);

[0048] 2. Next, under a standard atmospheric pressure and normal temperature, vapor-deposit the AAO template in the vapor atmosphere of perfluorooctyl-trichlorosilane for 80 to 100 minutes, and then bake it at 100°C for 13 to 15 minutes. A dense layer of organic molecules is formed, and this thin film makes the surface of the template have a very low surface energy, about 12 dynes / cm. figure 1 (b) is a schematic diagram of evaporation, figure 1 (c) is a schematic diagram of a low...

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Abstract

The invention provides a preparation method for preparing hard templates with low price, high reusability and adjustable micro-nano dimension used for nanoimprint in a large scale. The method comprises the following steps: firstly, adopting an electrochemical method for preparing regular anodized aluminum oxide (AAO) templates in oxalic acid electrolyte; then, forming a layer of perfluorooctane 1, 3-chlorosilane (CF3(CF2)5(CH2)2SiCl3) demolding agents through vapor deposition on the surface of AAO; spin coating a layer of ultraviolet curable or thermally curable photoresist on a silicon or quartz substrate; copying micro-nano structures of the anodized aluminum oxide templates to the surface of the photoresist by utilizing an ultraviolet nanoimprint or thermal nanoimprint technology; and finally, using reaction ion beams for etching (RIE). Thereby, the silicon or quartz templates which can be prepared in a large scale, have the advantages of low price, high reusability and adjustable micro-nano dimension and can be used for nanoimprint can be obtained on the silicon or quartz substrate.

Description

technical field [0001] The invention relates to a method for preparing a hard template, in particular to a method for preparing a hard template for nanoimprinting. Background technique [0002] Nanoimprint technology is a new technology of micro-nano processing and preparation that appeared in the mid-1990s. It is a method of directly using mechanical contact extrusion to redistribute the imprinted material between the template and the substrate. Compared with traditional lithography technology, it has the characteristics of high resolution; compared with high-resolution focused ion beam lithography, electron beam lithography, X-ray lithography and other technologies, it has high yield, low cost, Can be mass-produced and so on. Direct imprinting technology uses hard templates for imprinting. Compared with soft templates, it has the characteristics of high mechanical strength, not easy to deform, and can be reused many times. At the same time, the preparation of soft templa...

Claims

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Application Information

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IPC IPC(8): G03F1/00G03F7/00G03F1/80
Inventor 孙堂友徐智谋刘文邱飞陈志伟
Owner HUAZHONG UNIV OF SCI & TECH
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