An epitaxial growth method for improving the luminous efficiency of a GaN-based LED chip
A technology for LED chips and luminous efficiency, applied in gaseous chemical plating, coatings, electrical components, etc., can solve the problems of low hole concentration, low hole mobility and loss in the light-emitting layer, and achieve improved ionization concentration, The effect of increasing the hole concentration
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0048] The invention uses MOCVD to grow high-brightness GaN-based LED epitaxial wafers. Using high-purity H 2 or high purity N 2 or high purity H 2 and high purity N 2 The mixed gas as the carrier gas, high-purity NH 3 As the N source, the metal-organic source trimethylgallium (TMGa), triethylgallium (TEGa) is used as the gallium source, trimethylindium (TMIn) is used as the indium source, and the n-type dopant is silane (SiH 4 ), trimethylaluminum (TMAl) as the aluminum source, and the P-type dopant as magnesium dicene (CP 2 Mg), the substrate is (0001) plane sapphire. The specific growth method is as follows:
[0049] Please refer to figure 1 with figure 2 , an epitaxial growth method for improving the luminous efficiency of a GaN-based LED chip, comprising:
[0050] Growing undoped GaN layer, growing Si-doped n-type GaN layer, growing low-doped Si n-type GaN layer, growing light-emitting layer, growing low-temperature p-type GaN layer, growing p-type AlGaN layer, ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com