Preparation method of vacuum ultraviolet aluminum reflection mirror

A technology of vacuum ultraviolet and reflectors, applied in vacuum evaporation coating, sputtering coating, ion implantation coating, etc., can solve problems such as structural defects and influences, and achieve improved spectral performance, improved structural compactness, and absorption loss low effect

Active Publication Date: 2019-01-04
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is: to overcome the problems of surface oxidation of the aluminum film in the existing vacuum coating process and the influence of structural defects and absorption loss of the dielectric protective film layer on the performance of the vacuum ultraviolet aluminum reflector, and quickly deposit it at a low temperature through the physical vapor deposition technology Metal aluminum film and dielectric protective layer, combined with fluorination treatment technology, eliminates the oxide film layer on the surface of the aluminum film, improves the structural characteristics of the dielectric protective layer, reduces the absorption loss of the dielectric protective layer, and significantly improves the spectral characteristics and environmental stability of the vacuum ultraviolet aluminum reflector

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of vacuum ultraviolet aluminum reflection mirror
  • Preparation method of vacuum ultraviolet aluminum reflection mirror

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0035] Using BK7 glass as the substrate, first put it into the cleaning solution and ultrasonically clean it for 10 minutes, take it out and dry it with high-purity nitrogen, and then put it into the tooling of the vacuum coating equipment; seal the vacuum chamber door, and evacuate until the background vacuum is excellent. at 5.0×10 - 4 Pa, adopt thermal evaporation method to coat aluminum film, aluminum film thickness is 80 nanometers; Continue to adopt thermal evaporation method to deposit magnesium fluoride protective layer 1 fast then, protective layer 1 thickness is 5 nanometers; Then to the aluminum film reflector just prepared Fluorination treatment is carried out. During the fluorination treatment, a high-energy ion source is used to bombard the aluminum film mirror. The main working gas of the ion source is Xe gas, NF 3 As an auxiliary reaction gas, the oxide layer on the surface of the aluminum film in the newly prepared aluminum mirror is removed, and at the same ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
reflectanceaaaaaaaaaa
Login to view more

Abstract

The invention discloses a preparation method of a vacuum ultraviolet aluminum reflection mirror and belongs to the technical field of optical thin film. The method mainly aims at key factors, influencing optical performance of the aluminum reflection mirror, in the vacuum ultraviolet aluminum reflection mirror, the key factors include aluminum film oxidation and structure defects and absorption loss of a medium protection layer, a physical vapor deposition technology is adopted for coating aluminum film, then a first protection layer is quickly deposited, the first and second layers of deposited thin film are fluoridated, and finally a second protection layer is deposited. Compared with a traditional preparation method of an aluminum reflection mirror, the method has the advantages that the influence of aluminum film oxidation and absorption loss of the medium layer to the optical performance of the vacuum ultraviolet aluminum reflection mirror can be well reduced, the structure compactness of the protection layer is improved, and the environment stability of the vacuum ultraviolet aluminum reflection mirror is improved. The method has the advantages of being high in targeting performance and quality, simple and easy to implement.

Description

technical field [0001] The invention belongs to the field of optical thin films, and in particular relates to a preparation method of a vacuum ultraviolet aluminum reflector. Background technique [0002] In almost all optical systems, mirrors play an extremely important role. Generally, the reflector can be designed with an all-dielectric film system or a combination of a metal film and a dielectric film. The all-dielectric film system is formed by alternately combining two or more thin film materials with small absorption loss and different refractive index. Compared with the all-dielectric mirror, the metal film mirror has the characteristics of simple film system design, wide reflection band, thin film thickness, small mechanical stress, and low wavefront deformation of the device, and the metal film reflects when the light is incident at a large angle. The polarization separation of mirror reflected light is small, and it has excellent spectral polarization maintainin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/14C23C14/24C23C14/35C23C14/58
CPCC23C14/0694C23C14/14C23C14/24C23C14/35C23C14/5846
Inventor 郭春孔明东
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products