A preparation method of a TOPCon structure battery
A battery and pn junction technology, applied in the field of solar cells, can solve the problems of negative influence of battery conversion efficiency and complicated operation, and achieve the effects of improving performance, simplifying procedures and improving production efficiency
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[0029] The present invention relates to the preparation method of TOPCon double-sided battery, and its concrete process is as follows:
[0030] 1) Select an N-type silicon wafer with a resistivity of 0.5-10Ω·cm, clean and remove the damaged layer, and prepare a pyramid suede surface with an alkaline solution;
[0031] 2) Use thermal diffusion method or spin coating or spraying method to carry out boron diffusion to prepare p+ layer to form pn junction, and perform high temperature treatment at 1000 ° C; grow a BSG layer with a thickness of 70nm or 80nm or 90nm;
[0032] 3) Single-sided acid cleaning and etching: the boron diffusion layer is used as the front side, and the back side of the silicon wafer is removed and etched on one side; the specific method is to use a chain cleaning machine to float the silicon wafer in a mass concentration of 23 at room temperature. % hydrofluoric acid solution, use hydrofluoric acid to corrode the SiO2 layer on the back of the silicon wafer...
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