Novel oxalic acid-series ITO (Indium Tin Oxide) etching solution for panel display array manufacturing process

Abstract

The invention relates to a novel oxalic acid-series ITO (Indium Tin Oxide) etching solution for a panel display array manufacturing process. The novel oxalic acid-series ITO etching solution is prepared from the following raw materials in percentage by weight: 3.2 to 3.6 percent of oxalic acid, 5 to 900 ppm of surfactant and the balance of ultrapurepurified water. In the novel oxalic acid-series ITO etching solution, the novel surfactant is adopted, so that surface tension is lowered in order to realize the control for crystallite; meanwhile any other negative effects are avoided, and the better control for micro details is achieved; meanwhile no stable foam exists, and foam can be eliminated within 3 to 10 s, so that the influence of the foam on the etching is avoided, and the product yield is improved.

Description

technical field [0001] The invention relates to the technical field of a chemical etching solution for metal oxide materials, in particular to a novel oxalic acid-based ITO etching solution for a panel display array manufacturing process. Background technique [0002] ITO conductive glass is made by coating a layer of indium tin oxide (commonly known as ITO) film on the basis of soda-calcium-based or silicon-boron-based, aluminum-silicon-based substrate glass by sputtering, evaporation and other methods. ITO Conductive films are widely used in panel display, optoelectronics and various optical fields, usually using etching solution to etch out conductive lines. [0003] Publication (announcement) No. CN104388090A patent: an oxalic acid series ITO etching solution and its preparation method and application discloses an oxalic acid series ITO etching solution, which contains 0.5-10% oxalic acid, 0.1-0.5 % of alkylphenol polyoxyethylene ether series surfactants, 0.1-5% of orga...

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Problems solved by technology

[0003] Publication (announcement) No. CN104388090A patent: an oxalic acid series ITO etching solution and its preparation method and application discloses an oxalic acid series ITO etching solution, which contains 0.5-10% oxalic acid, 0.1-0.5 % of alkylphenol polyoxyethylene ether series surfactants, 0.1-5% of organic polyphosphonic acid and the rest of water, the preparation method is as follows: under normal temperature and pressure, add deionized water into the batching tank; under stirring, Add the formulated amount of oxalic acid, alkylphenol polyoxyethylene ether series surfactants and organic polyphosphonic acid; stir until completely dissolved, filter, and discharge; During the process, due to the addition of surfactants, a large amount of foam is generated, which affects the product yield. The existence of foam hinders the contact between the substrate and the etching solution, resulting in poor etching accuracy, obvious microcrystalline particles on the microstructure, and rough etching surface. and other defects

[0004] Publication (announcement) No. CN102382657A patent: a kind of etchant for transparent conductive film and its preparation method discloses a mixture of oxalic acid, o-fluorobenzoic acid (OFBA for short), alkylphenol polyoxyethylene ether, defoamer and water The obtained etching solution, the etching solution system has reduced the generation of foam, but the foam is still extremely obvious, and the negative impact of the foam on etching has not been completely solved; the current product has high requirements for etching precision, and there are still some problems in the use of this etching solution. Defects; To improve such defects, a new type of surfactant should be selected, which can not only eliminate the generation of foam, but also reduce the surface tension and improve the accuracy of etching

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