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Graphene mask and preparation method thereof

A kind of ene mask and graphene technology, applied in the field of graphene mask and its preparation, can solve the problems of inability to thoroughly purify pores, increase drug resistance, reduce drug efficacy, etc., achieve significant antioxidant properties, excellent sterilization performance, repair The effect of the epidermal barrier

Inactive Publication Date: 2019-02-01
GUANGDONG MORION NANOTECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In recent years, due to the widespread use of systemic or local broad-spectrum antibiotics in the treatment of acne, the drug resistance of the bacteria has increased significantly, and there is cross-resistance, which reduces the efficacy of drugs
Ordinary cosmetics can only control oil, thereby killing some acne bacteria, but they cannot completely purify pores

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] A graphene facial mask, the graphene facial mask per 100 parts by weight is composed of the following raw materials: 0.1 part of graphene, 0.05 part of chitosan, 1.0 part of gel, 0.1 part of honeysuckle extract, 0.1 part of dandelion extract, and danshen extract 0.1 part of substance, 0.01 part of spice, and the balance of water.

[0051] The graphene has an average thickness of 1 nm and a sheet size of 2 μm.

[0052] Specifically, the gelling agent is divided into 0.1 part of xanthan gum, 0.1 part of sodium alginate, 0.2 part of sodium carboxymethylcellulose, 0.2 part of polyvinyl alcohol, 0.2 part of pectin, and 0.2 part of galactan.

[0053] The spice is lavender.

[0054] A preparation method of graphene facial mask, it comprises the steps:

[0055] Step (1) Preparation of graphene aqueous solution: disperse the formulated amount of graphene in water under the action of ultrasound to obtain graphene aqueous solution. The ultrasonic time is 15 minutes and the tempe...

Embodiment 2

[0059] A graphene facial mask, the graphene facial mask per 100 parts by weight is composed of the following raw materials: 8 parts of graphene, 5.2 parts of chitosan, 8.8 parts of gel, 0.08 parts of spices, 2.9 parts of honeysuckle extract, 3.5 parts of dandelion extract parts, 2.5 parts of Danshen extract, and the balance of water.

[0060] The graphene has an average thickness of 5 nm and a sheet size of 50 μm.

[0061] The gelling agent is 1.1 parts of sodium alginate, 4.9 parts of sodium carboxymethyl cellulose, 0.5 parts of carboxyethyl cellulose, 0.41 parts of polyvinyl alcohol, 0.09 parts of gum arabic, 0.33 parts of pectin, and 0.72 parts of galactan. 0.75 parts of polyvinyl alcohol

[0062] The spices are fruit flavors.

[0063] A preparation method of graphene facial mask, it comprises the steps:

[0064] Step (1) Preparation of graphene aqueous solution: disperse the formulated amount of graphene in water under the action of ultrasound to obtain graphene aqueous s...

Embodiment 3

[0068] A graphene facial mask, the graphene facial mask per 100 parts by weight is composed of the following raw materials: 2.5 parts of graphene, 2.7 parts of chitosan, 4.9 parts of gel, 0.05 parts of spices, 1.2 parts of honeysuckle extract, 1.2 parts of dandelion extract parts, 1.2 parts of Danshen extract, and the balance of water.

[0069] The graphene has an average thickness of 3 nm and a sheet size of 100 μm.

[0070] The gelling agent is 3.1 parts of sodium carboxymethylcellulose, 0.7 parts of carboxyethyl cellulose, 0.2 parts of polyvinyl alcohol, 0.13 parts of pectin, and 0.77 parts of galactan.

[0071] The spices are fruit flavors.

[0072] A preparation method of graphene facial mask, it comprises the steps:

[0073] Step (1) Preparation of graphene aqueous solution: disperse the formulated amount of graphene in water under the action of ultrasound to obtain graphene aqueous solution, the ultrasonic time is 20min, and the temperature is 35°C;

[0074] Step (2)...

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Abstract

The invention relates to the technical field of cosmetics, in particular to a graphene mask and a preparation method thereof. Each 100 weight parts of the graphene mask is composed of: 0.1-8 parts ofgraphene, 0.05-5.2 parts of chitosan, 0-0.7 part of salicylic acid, 0.9-8.8 parts of gel, 0.1-2.9 parts of a honeysuckle extract, 0.1-3.5 parts of a dandelion extract, 0.1-2.5 parts of a salvia miltiorrhiza extract, 0.01-0.1 part of spice, and the balance water. According to the invention, graphene cooperates with chitosan, the honeysuckle extract, the dandelion extract and the salvia miltiorrhizaextract to serve as the main raw materials, the raw materials cooperate with each other for deep repair and treatment on skin comprehensively from the aspects of permeability, adsorption, antibacterial properties, oxidation resistance, repairability and the like, the graphene mask realizes quick and thorough elimination of propionibacterium acnes and thorough purification of pores, and is particularly effective on treatment of acne.

Description

technical field [0001] The invention relates to the technical field of cosmetics, in particular to a graphene facial mask and a preparation method thereof. Background technique [0002] Since its discovery in 2004, graphene has rapidly grown into a new star in the field of material science. Although it was discovered in a short time, due to its perfect hexagonal crystal structure and many super-excellent properties endowed by this special structure performance, such as up to 2600m 2 The theoretical specific surface area per g, thermal conductivity of 3000W / (m.k), tensile strength of 1060Gpa, perfect quantum tunneling effect and half-integer quantum Hall effect make it have many potential applications in real life. In 2010, Huang Qing's research group at the Institute of Physics, Chinese Academy of Sciences discovered for the first time that graphene and graphene oxide have antibacterial properties. Because they are potential physical antibiotics, graphene has set off an ups...

Claims

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Application Information

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IPC IPC(8): A61K8/19A61K8/365A61K8/73A61K8/9789A61P17/10A61P31/04A61Q19/00
CPCA61K8/19A61K8/365A61K8/736A61Q19/00A61K8/9789A61P17/10A61P31/04
Inventor 蔡金明戴东方王冠林蔡晓明
Owner GUANGDONG MORION NANOTECHNOLOGY CO LTD
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