A method for changing the crystal structure of niobium nitride superconducting thin film
A technology of niobium nitride thin film and crystal structure, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problem that the micro-nano optical and thermal properties of devices are very different, and no niobium nitride thin film has been proposed. And other issues
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[0029] Example: First, prepare the substrate, clean the substrate, and in the cleaning stage, take three clean beakers, pour appropriate amounts of analytically pure acetone, analytically pure ethanol, and deionized water respectively, and place the substrate in the three beakers in turn for ultrasonic cleaning 10 minutes to ensure that the protective glue on the silicon or silicon oxide is completely removed; blow the film, post-bake, and then use a nitrogen gun to dry the substrate. Place the substrate on a baking table at 90°C for about 3 minutes. After that, we will carry out magnetron sputtering, the steps are as follows:
[0030] (1) Turn on the machine, turn on the main power supply of the instrument, the power supply of the chiller, the power supply of the mechanical pump in the main room, and open the air pressure channel; when the vacuum degree of the main and auxiliary rooms drops below 10Pa, run the molecular pump; when the vacuum degree of the main and auxiliary r...
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