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A method for changing the crystal structure of niobium nitride superconducting thin film

A technology of niobium nitride thin film and crystal structure, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problem that the micro-nano optical and thermal properties of devices are very different, and no niobium nitride thin film has been proposed. And other issues

Active Publication Date: 2020-10-02
NANJING UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] At present, there is no method for preparing niobium nitride thin films with lattice changes, and for superconducting nano-devices, the devices developed by niobium nitride materials with different lattice structures are very different in micro-nano optical and thermal properties.

Method used

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  • A method for changing the crystal structure of niobium nitride superconducting thin film
  • A method for changing the crystal structure of niobium nitride superconducting thin film
  • A method for changing the crystal structure of niobium nitride superconducting thin film

Examples

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Embodiment

[0029] Example: First, prepare the substrate, clean the substrate, and in the cleaning stage, take three clean beakers, pour appropriate amounts of analytically pure acetone, analytically pure ethanol, and deionized water respectively, and place the substrate in the three beakers in turn for ultrasonic cleaning 10 minutes to ensure that the protective glue on the silicon or silicon oxide is completely removed; blow the film, post-bake, and then use a nitrogen gun to dry the substrate. Place the substrate on a baking table at 90°C for about 3 minutes. After that, we will carry out magnetron sputtering, the steps are as follows:

[0030] (1) Turn on the machine, turn on the main power supply of the instrument, the power supply of the chiller, the power supply of the mechanical pump in the main room, and open the air pressure channel; when the vacuum degree of the main and auxiliary rooms drops below 10Pa, run the molecular pump; when the vacuum degree of the main and auxiliary r...

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Abstract

The invention discloses a method of changing a niobium nitride superconducting film crystal structure. The method comprises the following steps of cleaning and preparing a substrate; bombarding milling the substrate with an argon ion beam; preparing a film with reactive magnetron sputtering; scanning a diffraction peak value with an X-ray diffractometer; and observing a crystal Bragg structure with a transmission electron microscope. The method provided by the invention solves the accurate demand on different crystal structures and different superconducting properties in preparation of the superconducting niobium nitride film with magnetron sputtering.

Description

technical field [0001] The invention belongs to the field of high-precision lattice structure measurement, and in particular relates to a method for changing the crystal structure of a niobium nitride thin film. Background technique [0002] The preparation of niobium nitride (NbN) thin films is a key step in the preparation of superconducting nanowire single photon detectors, and the research and processing of thin film properties are also very important tasks in the preparation of superconducting nanowire single photon detectors with excellent performance. [0003] As a superconducting material, niobium nitride is widely used in various superconducting devices, including superconducting nanowire single-photon detectors, Josephson junctions, fast single-flux quantum circuits, and thermal electron radiators. In 1952, Rogener found that the superconducting critical temperature Tc of NbNx was related to the ratio of niobium and nitrogen, which also inspired our experiments. T...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0036C23C14/0641C23C14/35
Inventor 王力波陈实康琳贾小氢
Owner NANJING UNIV