Preparation method of molybdenum disulfide (MoS2) based nanocomposite film doped with Ti and C

A nano-composite, molybdenum disulfide technology, applied in ion implantation plating, metal material coating technology, coating and other directions, can solve problems such as wear failure, improve wear resistance life, improve strength and wear resistance, improve adaptive effect

Inactive Publication Date: 2020-06-19
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The object of the present invention is to provide a kind of MoS doped with Ti and C 2 The preparation of the base nanocomposite film is mainly used as a nanocomposite solid lubricating film for the remote operation system of the nuclear fusion device to solve the wear failure problem caused by the oil-free state of the joint parts of the remote operation system of the nuclear fusion device when used in the atmosphere / vacuum environment

Method used

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  • Preparation method of molybdenum disulfide (MoS2) based nanocomposite film doped with Ti and C
  • Preparation method of molybdenum disulfide (MoS2) based nanocomposite film doped with Ti and C
  • Preparation method of molybdenum disulfide (MoS2) based nanocomposite film doped with Ti and C

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Experimental program
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Effect test

Embodiment 1

[0034] (1) Install pure molybdenum disulfide targets, high-purity metal Ti targets and graphite targets as sputtering materials at the three target positions of the multi-target magnetron sputtering system;

[0035] (2) Place the monocrystalline silicon wafer in absolute ethanol and analytically pure petroleum ether for ultrasonic cleaning, 10 minutes each time. After drying, place it on the sample stage in the vacuum chamber; the sample stage keeps rotating during the deposition process, and the rotation rate is 6~9 rpm;

[0036] (3) Use the mechanical pump of the magnetron sputtering system and the secondary exhaust system of the molecular pump to pump the vacuum of the vacuum chamber to 1.0×10 -3 Pa; Introduce high-purity argon gas and adjust the air pressure to 6.0 Pa, introduce -550 V pulse bias voltage on the sample stage, and perform plasma cleaning for 10 minutes;

[0037] (4) Adjust the vacuum chamber pressure to 0.55 Pa, and use a DC power supply (current 5.0A) to ...

Embodiment 2

[0042] (1) Install pure molybdenum disulfide targets, high-purity metal Ti targets and graphite targets as sputtering materials at the three target positions of the multi-target magnetron sputtering system;

[0043] (2) Place GCr15 bearing steel with surface roughness ≤ 1.6 μm in absolute ethanol and analytical pure petroleum ether for ultrasonic cleaning, each time for 15 minutes. After drying, place it on the sample stage in the vacuum chamber; the sample stage keeps rotating during the deposition process, and the rotation rate is 6 revolutions per minute;

[0044] (3) Use the mechanical pump of the magnetron sputtering system and the secondary exhaust system of the molecular pump to pump the vacuum of the vacuum chamber to 1.0×10 -3 Pa; Introduce high-purity argon gas and adjust the air pressure to 5.0 Pa, introduce -550 V pulse bias voltage on the sample stage, and perform plasma cleaning, and the cleaning time is 30 minutes;

[0045] (4) Adjust the pressure of the vacuu...

Embodiment 3

[0050] (1) Install pure molybdenum disulfide targets, high-purity metal Ti targets and graphite targets as sputtering materials at the three target positions of the multi-target magnetron sputtering system;

[0051] (2) Place the thrust bearing in absolute ethanol and analytically pure petroleum ether for ultrasonic cleaning, 15 minutes each time. After drying, place it on the sample stage in the vacuum chamber; the sample stage keeps rotating during the deposition process, and the rotation rate is 9 revolutions per minute;

[0052] (3) Use the mechanical pump of the magnetron sputtering system and the secondary exhaust system of the molecular pump to pump the vacuum of the vacuum chamber to 1.0×10 -3 Pa; Introduce high-purity argon gas and adjust the air pressure to 6.0 Pa, introduce -550 V pulse bias voltage on the sample stage, and perform plasma cleaning, and the cleaning time is 30 minutes;

[0053] (4) Adjust the pressure of the vacuum chamber to 0.5 Pa, and use a DC p...

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Abstract

The invention discloses a preparation method of a molybdenum disulfide (MoS2) based nanocomposite film doped with Ti and C. The preparation method comprises the steps that a multi-target reactive magnetron sputtering system is utilized, MoS2 is used as a matrix material, nanoscale porous channels of the MoS2 film are filled with active Ti and DLC hard cluster particles through a reactive sputtering means, and thus a nanocomposite solid lubricating film with high environmental adaptability is constructed; and meanwhile through the deposition of Ti element gradient layers, the strength and film-base adhesion of the film are improved by using the principle of element mutual diffusion, so as to prolong the wear resistance life of the composite film. The mechanical properties test results showthat the hardness, elastic modulus and elastic recovery of the nanocomposite film are all significantly higher than those of pure MoS2 film; and the friction performance test results show that the nanocomposite film has a low friction coefficient and long wear resistance life under vacuum and atmospheric environment, and thus the service requirements of a remote control system of a nuclear fusiondevice are met.

Description

technical field [0001] The invention relates to a kind of MoS doped with Ti and C 2 The preparation method of the base nanocomposite film is mainly used for the nano solid lubricating film of the movable part of the remote operation system of the nuclear fusion device, and belongs to the technical field of solid composite materials and the application field of self-lubricating materials in the nuclear irradiation environment. Background technique [0002] Superconducting Tokamak Eastern Superring (EAST) is an experimental device built by China in 2006 to realize controllable thermonuclear fusion reaction. The operation of this fusion device has laid a good engineering technology for steady state and advanced fusion experimental reactors. and physical basis. Since the first wall material of the device inevitably suffers radiation damage during the plasma discharge process, it is necessary to regularly maintain and replace the first wall material through the remote operation ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/02C23C14/16C23C14/50
CPCC23C14/0036C23C14/022C23C14/025C23C14/027C23C14/0623C23C14/165C23C14/352C23C14/505
Inventor 王鹏柴利强乔丽赵晓宇段泽文
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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