Method for manufacturing a low-temperature polysilicon display panel

Abstract

The invention discloses a method for manufacturing a low-temperature polysilicon display panel. The method comprises the steps of: a vacuum environment providing step: providing a vacuum environment;a substrate providing step: providing a glass substrate; a step of forming a next silicon oxide layer: forming the next silicon oxide layer on the glass substrate; a step of forming a silicon nitridelayer: comprising forming a silicon nitride layer on the next silicon oxide layer; a step of forming of a last silicon monoxide layer: forming a last silicon monoxide layer on the silicon nitride layer; a noncrystalline silicon forming step: forming a noncrystalline silicon layer on the last silicon monoxide layer in the vacuum environment; a protection layer forming step: forming a protection layer on the noncrystalline silicon layer; and an annealing step: performing quasimolecule laser annealing for the noncrystalline silicon layer to form polycrystalline silicon on the noncrystalline silicon layer. The method for manufacturing a low-temperature polysilicon display panel avoids the problem that the generated polycrystalline silicon crystal lattice is defective due to residual airborne particles or metal ions on the amorphous silicon layer.

Description

technical field [0001] The present invention relates to a method for manufacturing a low-temperature polysilicon display panel, which can avoid the process of performing Excimer-Laser Annealing (ELA) on an amorphous silicon (a-Si) layer. Particles or metal ions adhering from the air remain on the silicon layer, causing defects in the crystal lattice of polysilicon formed by the amorphous silicon layer and reducing the yield of the display panel. Background technique [0002] Low Temperature Poly-silicon (LTPS) is a new generation of thin film transistor liquid crystal display (Thin Film Transistor Liquid Crystal Display, TFT-LCD) technology, the biggest difference between the technology and the traditional amorphous silicon display is that the LTPS response speed is relatively fast Fast, and has the advantages of high brightness, high resolution, and low power consumption. [0003] In the process of manufacturing low-temperature polysilicon display panels, it is necessary t...

AI Technical Summary

Problems solved by technology

However, since the cleaning step with hydrofluoric acid is carried out in a general atmospheric environment, the problem of particles or metal ions remaining on the surface of the amorphous silicon layer after cleaning cannot be avoided, and the use of hydrofluoric acid is likely to cause product pollution and environmental pollution. Pollution

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