Unlock instant, AI-driven research and patent intelligence for your innovation.

Repairing mask containing EGF and r-PGA and preparation method thereof

A facial mask, r-pga technology, applied in the field of repairing mask containing EGF and r-PGA and its preparation, can solve problems such as unsatisfactory repairing time and continuous effect, inability to truly repair skin damage, failure to achieve deep repair, etc. Achieve the effect of enhancing acne scar repair and skin reconstruction ability, improving skin immunity, and eliminating skin redness and swelling

Inactive Publication Date: 2019-05-03
广州市美夫兰化妆品有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Traditional facial masks only have the function of temporarily relieving skin dehydration and moisturizing, but cannot really repair skin damage. The skin care effect is poor, or only short-term effect, repair time and continuous effect are not ideal, deep repair has not been achieved, and the skin is not activated enough , so that the desired effect cannot be achieved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Embodiment 1 A kind of repairing mask containing EGF and r-PGA

[0028] Raw material formula: 80 parts of deionized water, 3 parts of 1,3-butanediol, 0.2 parts of transparent xanthan gum, 0.02 parts of disodium EDTA, 0.18 parts of hyaluronic acid, 0.9 parts of r-PGA, 1 part of glycerin, peony root 0.9 parts of extract, 11.1 parts of EGF, 0.45 parts of p-hydroxyacetophenone, 0.6 parts of 1,2-hexanediol, 0.9 parts of yeast extract, and 1 part of apple stem cells.

[0029] The peony root extract is prepared by the following steps:

[0030] a, select peony root, vibrate and sieve to remove impurities, and break into peony root powder;

[0031] b. Wet the crushed peony root with 2.5 times the amount of water, then continuously add 23 times the amount of 96°C hot water for continuous countercurrent extraction for 1.5 hours, collect the extract, and squeeze the peony root residue to recover part of the liquid before discharging , the recovered part of the liquid is combined ...

Embodiment 2

[0041] Embodiment 2 A kind of repairing mask containing EGF and r-PGA

[0042] The difference between embodiment 2 and embodiment 1 is that the raw material ratio of the repairing facial mask is different, and all the other methods and steps are the same as embodiment 1;

[0043] Example 2 Raw material formula: 70 parts of deionized water, 2 parts of 1,3-butanediol, 0.1 part of transparent xanthan gum, 0.01 part of disodium EDTA, 0.1 part of hyaluronic acid, 0.7 part of r-PGA, 0.6 part of glycerin , 0.5 parts of peony root extract, 8 parts of EGF, 0.35 parts of p-hydroxyacetophenone, 0.4 parts of 1,2-hexanediol, 0.7 parts of yeast extract, and 0.7 parts of apple stem cells.

Embodiment 3

[0044] Embodiment 3 A kind of repairing mask containing EGF and r-PGA

[0045] The difference between embodiment 3 and embodiment 1 is that the raw material ratio of the repairing facial mask is different, and all the other methods and steps are the same as embodiment 1;

[0046] Example 3 Raw material formula: 90 parts of deionized water, 5 parts of 1,3-butanediol, 0.25 parts of transparent xanthan gum, 0.03 parts of disodium EDTA, 0.2 parts of hyaluronic acid, 1.4 parts of r-PGA, 1.3 parts of glycerin , 1.2 parts of peony root extract, 14 parts of EGF, 0.65 parts of p-hydroxyacetophenone, 0.8 parts of 1,2-hexanediol, 1.3 parts of yeast extract, 1.2 parts of apple stem cells.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of cosmetics, in particular to a repairing mask containing EGF and r-PGA, wherein the repairing mask comprises the following raw materials in parts by weight: 70-90 parts of deionized water, 2-5 parts of 1,3-butanediol, 0.1-0.25 parts of transparent xanthan gum, 0.01-0.03 parts of EDTA disodium, 0.1-0.2 parts of hyaluronic acid, 0.7-1.4 parts of r-PGA ,0.6-1.3 parts of glycerin, 0.5-1.2 parts of a peony root extract, 8-14 parts of EGF, 0.35-0.65 parts of p-hydroxyacetophenone, 0.4-0.8 parts of 1,2-hexanediol, 0.7-1.3 parts of a yeast extract, and 0.7-1.2 parts of apple stem cells. The raw material ratio of the repairing mask is within the scope of the present invention, and the skin can be quickly penetrated and deep repaired, and the repairingmask has a very good effect of instantly repairing and soothing the skin, has a good effect on the continuous healing of various skin problems, and is the mask with a very good repair effect.

Description

technical field [0001] The invention relates to the technical field of cosmetics, in particular to a repairing mask containing EGF and r-PGA and a preparation method thereof. Background technique [0002] The skin acts as a protective barrier for the human body, and it protects various tissues and organs in the body from physical, mechanical, chemical and pathogenic microorganisms. The facial skin of the human body is often exposed to the outside world and is vulnerable to external aggression. The unhealthy state of the skin is characterized by loose, thin, water content, dryness, scales, and loss of luster; elasticity and firmness also decrease; wrinkles form , and gradually increased and deepened. In addition, the sensitivity of the skin increases and the pigmentation deepens. The reason is that the renewal rate of the epidermis slows down, the skin rebuilding ability weakens, the skin collagen synthesis slows down, the skin immunity decreases, and the pigment distributi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/99A61K8/64A61K8/88A61K8/9728A61Q19/00A61Q19/02A61Q19/08
Inventor 张宇周璇
Owner 广州市美夫兰化妆品有限公司